Effect of oxygen plasma on nanomechanical silicon nitride resonators

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LUHMANN, Niklas, Artur JACHIMOWICZ, Johannes SCHALKO, Pedram SADEGHI, Markus SAUER, Annette FOELSKE-SCHMITZ, Silvan SCHMID, 2017. Effect of oxygen plasma on nanomechanical silicon nitride resonators. In: Applied Physics Letters. 111(6), 063103. ISSN 0003-6951. eISSN 1077-3118. Available under: doi: 10.1063/1.4989775

@article{Luhmann2017-08-07Effec-40259, title={Effect of oxygen plasma on nanomechanical silicon nitride resonators}, year={2017}, doi={10.1063/1.4989775}, number={6}, volume={111}, issn={0003-6951}, journal={Applied Physics Letters}, author={Luhmann, Niklas and Jachimowicz, Artur and Schalko, Johannes and Sadeghi, Pedram and Sauer, Markus and Foelske-Schmitz, Annette and Schmid, Silvan}, note={Article Number: 063103} }

<rdf:RDF xmlns:dcterms="http://purl.org/dc/terms/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#" xmlns:foaf="http://xmlns.com/foaf/0.1/" xmlns:void="http://rdfs.org/ns/void#" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/rdf/resource/123456789/40259"> <dc:contributor>Luhmann, Niklas</dc:contributor> <dcterms:abstract xml:lang="eng">Precise control of tensile stress and intrinsic damping is crucial for the optimal design of nanomechanical systems for sensor applications and quantum optomechanics in particular. In this letter, we study the influence of oxygen plasma on the tensile stress and intrinsic damping of nanomechanical silicon nitride resonators. Oxygen plasma treatments are common steps in micro and nanofabrication. We show that oxygen plasma for only a few minutes oxidizes the silicon nitride surface, creating several nanometer thick silicon dioxide layers with a compressive stress of 1.30(16) GPa. Such oxide layers can cause a reduction in the effective tensile stress of a 50 nm thick stoichiometric silicon nitride membrane by almost 50%. Additionally, intrinsic damping linearly increases with the silicon dioxide film thickness. An oxide layer of 1.5 nm grown in just 10 s in a 50 W oxygen plasma almost doubled the intrinsic damping. The oxide surface layer can be efficiently removed in buffered hydrofluoric acid.</dcterms:abstract> <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/rdf/resource/123456789/41"/> <dc:contributor>Sauer, Markus</dc:contributor> <dc:creator>Luhmann, Niklas</dc:creator> <dc:contributor>Sadeghi, Pedram</dc:contributor> <foaf:homepage rdf:resource="http://localhost:8080/jspui"/> <dc:contributor>Schmid, Silvan</dc:contributor> <bibo:uri rdf:resource="https://kops.uni-konstanz.de/handle/123456789/40259"/> <dc:contributor>Jachimowicz, Artur</dc:contributor> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2017-10-06T07:23:59Z</dcterms:available> <dc:creator>Sadeghi, Pedram</dc:creator> <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2017-10-06T07:23:59Z</dc:date> <dcterms:title>Effect of oxygen plasma on nanomechanical silicon nitride resonators</dcterms:title> <dc:contributor>Foelske-Schmitz, Annette</dc:contributor> <dc:creator>Schalko, Johannes</dc:creator> <dc:creator>Foelske-Schmitz, Annette</dc:creator> <dc:language>eng</dc:language> <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/rdf/resource/123456789/41"/> <dc:creator>Sauer, Markus</dc:creator> <dc:creator>Schmid, Silvan</dc:creator> <dcterms:issued>2017-08-07</dcterms:issued> <dc:contributor>Schalko, Johannes</dc:contributor> <dc:creator>Jachimowicz, Artur</dc:creator> </rdf:Description> </rdf:RDF>

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