Investigation of Poly-Si/SiOx Passivating Contacts at Low Thermal Budgets

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dc.contributor.authorOkker, Tobias
dc.date.accessioned2025-03-31T12:44:15Z
dc.date.available2025-03-31T12:44:15Z
dc.date.issued2024-11
dc.description.versionpublished
dc.identifier.ppn1920876529
dc.identifier.urihttps://kops.uni-konstanz.de/handle/123456789/72829
dc.language.isoeng
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dc.subject.ddc530
dc.titleInvestigation of Poly-Si/SiO<sub>x</sub> Passivating Contacts at Low Thermal Budgetseng
dc.typeDOCTORAL_THESIS
dspace.entity.typePublication
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  title={Investigation of Poly-Si/SiO<sub>x</sub> Passivating Contacts at Low Thermal Budgets},
  year={2024},
  author={Okker, Tobias},
  address={Konstanz},
  school={Universität Konstanz}
}
kops.citation.iso690OKKER, Tobias, 2024. Investigation of Poly-Si/SiOx Passivating Contacts at Low Thermal Budgets [Dissertation]. Konstanz: Universität Konstanzdeu
kops.citation.iso690OKKER, Tobias, 2024. Investigation of Poly-Si/SiOx Passivating Contacts at Low Thermal Budgets [Dissertation]. Konstanz: University of Konstanzeng
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kops.date.examination2025-03-24
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