@inproceedings{Frigerio2015-08Heavi-33196,
  year={2015},
  doi={10.1109/Group4.2015.7305964},
  title={Heavily phosphorous-doped Germanium thin films for mid-infrared plasmonics},
  isbn={978-1-4799-8255-4},
  publisher={IEEE},
  booktitle={2015 IEEE 12th International Conference on Group IV Photonics (GFP)},
  pages={94--95},
  author={Frigerio, Jacopo and Baldassarre, Leonetta and Sakat, Emilie and Samarelli, Antonio and Gallacher, Kevin and Fischer, Marco P. and Brida, Daniele and Paul, Douglas J. and Isella, Giovanni and Biagioni, Paolo and Ortolani, Michele}
}

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    <dc:contributor>Brida, Daniele</dc:contributor>
    <dcterms:abstract xml:lang="eng">Heavily doped Ge thin films grown on different substrates have been investigated by infrared (IR) reflectometry. Screened plasma frequency and losses have been determined to assess the possibilities and limitations of Ge for mid infrared plasmonic.</dcterms:abstract>
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    <dc:creator>Samarelli, Antonio</dc:creator>
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    <dc:contributor>Paul, Douglas J.</dc:contributor>
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    <dc:contributor>Isella, Giovanni</dc:contributor>
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    <dc:creator>Ortolani, Michele</dc:creator>
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    <dc:creator>Baldassarre, Leonetta</dc:creator>
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    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2016-03-02T11:20:42Z</dc:date>
    <dc:contributor>Samarelli, Antonio</dc:contributor>
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    <dc:creator>Paul, Douglas J.</dc:creator>
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    <dcterms:title>Heavily phosphorous-doped Germanium thin films for mid-infrared plasmonics</dcterms:title>
    <dc:contributor>Frigerio, Jacopo</dc:contributor>
    <dc:contributor>Ortolani, Michele</dc:contributor>
    <dc:contributor>Baldassarre, Leonetta</dc:contributor>
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