Laser-annealing of thin semiconductor films

Kurzanzeige
dc.contributor.authorBoneberg, Johannes
dc.contributor.authorNedelcu, Johanndeu
dc.contributor.authorBucher, Ernst
dc.contributor.authorLeiderer, Paul
dc.date.accessioned2011-03-24T14:51:36Zdeu
dc.date.available2011-03-24T14:51:36Zdeu
dc.date.issued1994-12-12
dc.description.abstractOptical reflectivity and transmissivity measurements have been used to investigate the dynamics of melting and recrystallisation of thin films of Si and Ge after laser-annealing with a ns Nd:YAG-laser pulse. We report on temperature dependent changes of the reflectivity of the liquid phase above and below the melting point and on various nucleation and solidification scenarios in thin film, depending on the energy density of the amding laser.eng
dc.description.versionpublished
dc.format.mimetypeapplication/pdfdeu
dc.identifier.citationFirst publ. in: Second International Symposium on Advanced Laser Technologies, Proceedings of SPIE 2332 (1993), pp. 1-14deu
dc.identifier.doi10.1117/12.195876
dc.identifier.ppn265724333deu
dc.identifier.urihttp://kops.uni-konstanz.de/handle/123456789/4948
dc.language.isoengdeu
dc.legacy.dateIssued2007deu
dc.rightsAttribution-NonCommercial-NoDerivs 2.0 Generic
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/
dc.subject.ddc530deu
dc.titleLaser-annealing of thin semiconductor filmseng
dc.typeINPROCEEDINGSdeu
dspace.entity.typePublication
kops.citation.bibtex
@inproceedings{Boneberg1994-12-12Laser-4948,
  year={1994},
  doi={10.1117/12.195876},
  title={Laser-annealing of thin semiconductor films},
  number={2332},
  publisher={SPIE},
  series={SPIE Proceedings},
  booktitle={Second International Symposium on Advanced Laser Technologies},
  pages={2--15},
  editor={Pustovoy, Vladimir I. and Jelinek, Miroslav},
  author={Boneberg, Johannes and Nedelcu, Johann and Bucher, Ernst and Leiderer, Paul}
}
kops.citation.iso690BONEBERG, Johannes, Johann NEDELCU, Ernst BUCHER, Paul LEIDERER, 1994. Laser-annealing of thin semiconductor films. Advanced Laser Technologies: International Symposium. Prague, Czech Republic. In: PUSTOVOY, Vladimir I., ed., Miroslav JELINEK, ed.. Second International Symposium on Advanced Laser Technologies. SPIE, 1994, pp. 2-15. SPIE Proceedings. 2332. Available under: doi: 10.1117/12.195876deu
kops.citation.iso690BONEBERG, Johannes, Johann NEDELCU, Ernst BUCHER, Paul LEIDERER, 1994. Laser-annealing of thin semiconductor films. Advanced Laser Technologies: International Symposium. Prague, Czech Republic. In: PUSTOVOY, Vladimir I., ed., Miroslav JELINEK, ed.. Second International Symposium on Advanced Laser Technologies. SPIE, 1994, pp. 2-15. SPIE Proceedings. 2332. Available under: doi: 10.1117/12.195876eng
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    <dcterms:abstract xml:lang="eng">Optical reflectivity and transmissivity measurements have been used to investigate the dynamics of melting and recrystallisation of thin films of Si and Ge after laser-annealing with a ns Nd:YAG-laser pulse. We report on temperature dependent changes of the reflectivity of the liquid phase above and below the melting point and on various nucleation and solidification scenarios in thin film, depending on the energy density of the amding laser.</dcterms:abstract>
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kops.conferencefieldAdvanced Laser Technologies: International Symposium, Prague, Czech Republicdeu
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kops.sourcefieldPUSTOVOY, Vladimir I., ed., Miroslav JELINEK, ed.. <i>Second International Symposium on Advanced Laser Technologies</i>. SPIE, 1994, pp. 2-15. SPIE Proceedings. 2332. Available under: doi: 10.1117/12.195876deu
kops.sourcefield.plainPUSTOVOY, Vladimir I., ed., Miroslav JELINEK, ed.. Second International Symposium on Advanced Laser Technologies. SPIE, 1994, pp. 2-15. SPIE Proceedings. 2332. Available under: doi: 10.1117/12.195876deu
kops.sourcefield.plainPUSTOVOY, Vladimir I., ed., Miroslav JELINEK, ed.. Second International Symposium on Advanced Laser Technologies. SPIE, 1994, pp. 2-15. SPIE Proceedings. 2332. Available under: doi: 10.1117/12.195876eng
kops.title.conferenceAdvanced Laser Technologies: International Symposium
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source.contributor.editorPustovoy, Vladimir I.
source.contributor.editorJelinek, Miroslav
source.publisherSPIE
source.relation.ispartofseriesSPIE Proceedings
source.titleSecond International Symposium on Advanced Laser Technologies

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