Role of thermal SiO2 on passivation of highly doped layer

dc.contributor.authorDastgheib-Shirazi, Amir
dc.contributor.authorHahn, Giso
dc.contributor.authorTerheiden, Barbara
dc.date.accessioned2019-09-20T09:06:31Z
dc.date.available2019-09-20T09:06:31Z
dc.date.issued2019eng
dc.description.abstractIn this paper we investigate the influence of thermal oxidation during and after POCl3 diffusion. The main focus here is on the question of how far the presence of a thermally grown oxide layer has an influence on the emitter passivation. For this purpose, characterization methods such as electrochemical capacitance-voltage measurements and QSSPC are used. The novel finding of this paper is that in the case of a stack of passivation layers, the presence of the thermal oxide does not make a significant contribution to improved emitter passivation.eng
dc.description.versionpublishedeng
dc.identifier.doi10.1063/1.5123862eng
dc.identifier.ppn1677391456
dc.identifier.urihttps://kops.uni-konstanz.de/handle/123456789/46996
dc.language.isoengeng
dc.rightsterms-of-use
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dc.subject.ddc530eng
dc.titleRole of thermal SiO<sub>2</sub> on passivation of highly doped layereng
dc.typeINPROCEEDINGSeng
dspace.entity.typePublication
kops.citation.bibtex
@inproceedings{DastgheibShirazi2019therm-46996,
  year={2019},
  doi={10.1063/1.5123862},
  title={Role of thermal SiO<sub>2</sub> on passivation of highly doped layer},
  number={2147, 1},
  isbn={978-0-7354-1892-9},
  publisher={AIP Publishing},
  address={Melville, New York},
  series={AIP Conference Proceedings},
  booktitle={SiliconPV 2019, The 9th International Conference on Crystalline Silicon Photovoltaics : 8-10 April 2019, Leuven, Belgium},
  editor={Poortmans, Jef},
  author={Dastgheib-Shirazi, Amir and Hahn, Giso and Terheiden, Barbara},
  note={Article Number: 070001}
}
kops.citation.iso690DASTGHEIB-SHIRAZI, Amir, Giso HAHN, Barbara TERHEIDEN, 2019. Role of thermal SiO2 on passivation of highly doped layer. SiliconPV 2019 : The 9th International Conference on Crystalline Silicon Photovoltaics. Leuven, Belgium, 8. Apr. 2019 - 10. Apr. 2019. In: POORTMANS, Jef, ed. and others. SiliconPV 2019, The 9th International Conference on Crystalline Silicon Photovoltaics : 8-10 April 2019, Leuven, Belgium. Melville, New York: AIP Publishing, 2019, 070001. AIP Conference Proceedings. 2147, 1. eISSN 0094-243X. ISBN 978-0-7354-1892-9. Available under: doi: 10.1063/1.5123862deu
kops.citation.iso690DASTGHEIB-SHIRAZI, Amir, Giso HAHN, Barbara TERHEIDEN, 2019. Role of thermal SiO2 on passivation of highly doped layer. SiliconPV 2019 : The 9th International Conference on Crystalline Silicon Photovoltaics. Leuven, Belgium, Apr 8, 2019 - Apr 10, 2019. In: POORTMANS, Jef, ed. and others. SiliconPV 2019, The 9th International Conference on Crystalline Silicon Photovoltaics : 8-10 April 2019, Leuven, Belgium. Melville, New York: AIP Publishing, 2019, 070001. AIP Conference Proceedings. 2147, 1. eISSN 0094-243X. ISBN 978-0-7354-1892-9. Available under: doi: 10.1063/1.5123862eng
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kops.conferencefieldSiliconPV 2019 : The 9th International Conference on Crystalline Silicon Photovoltaics, 8. Apr. 2019 - 10. Apr. 2019, Leuven, Belgiumdeu
kops.date.conferenceEnd2019-04-10eng
kops.date.conferenceStart2019-04-08eng
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kops.sourcefieldPOORTMANS, Jef, ed. and others. <i>SiliconPV 2019, The 9th International Conference on Crystalline Silicon Photovoltaics : 8-10 April 2019, Leuven, Belgium</i>. Melville, New York: AIP Publishing, 2019, 070001. AIP Conference Proceedings. 2147, 1. eISSN 0094-243X. ISBN 978-0-7354-1892-9. Available under: doi: 10.1063/1.5123862deu
kops.sourcefield.plainPOORTMANS, Jef, ed. and others. SiliconPV 2019, The 9th International Conference on Crystalline Silicon Photovoltaics : 8-10 April 2019, Leuven, Belgium. Melville, New York: AIP Publishing, 2019, 070001. AIP Conference Proceedings. 2147, 1. eISSN 0094-243X. ISBN 978-0-7354-1892-9. Available under: doi: 10.1063/1.5123862deu
kops.sourcefield.plainPOORTMANS, Jef, ed. and others. SiliconPV 2019, The 9th International Conference on Crystalline Silicon Photovoltaics : 8-10 April 2019, Leuven, Belgium. Melville, New York: AIP Publishing, 2019, 070001. AIP Conference Proceedings. 2147, 1. eISSN 0094-243X. ISBN 978-0-7354-1892-9. Available under: doi: 10.1063/1.5123862eng
kops.title.conferenceSiliconPV 2019 : The 9th International Conference on Crystalline Silicon Photovoltaicseng
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source.contributor.editorPoortmans, Jef
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source.identifier.isbn978-0-7354-1892-9eng
source.publisherAIP Publishingeng
source.publisher.locationMelville, New Yorkeng
source.relation.ispartofseriesAIP Conference Proceedingseng
source.titleSiliconPV 2019, The 9th International Conference on Crystalline Silicon Photovoltaics : 8-10 April 2019, Leuven, Belgiumeng

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