Dynamic secondary ion mass spectroscopy of Au nanoparticles on Si wafer using Bi3+ as primary ion coupled with surface etching by Ar cluster ion beam : The effect of etching conditions on surface structure

Kurzanzeige
dc.contributor.authorPark, Eun Ji
dc.contributor.authorChoi, Chang Min
dc.contributor.authorKim, Il Hee
dc.contributor.authorKim, Jung-Hwan
dc.contributor.authorLee, Gaehang
dc.contributor.authorJin, Jong Sung
dc.contributor.authorGanteför, Gerd
dc.contributor.authorKim, Young Dok
dc.contributor.authorChoi, Myoung Choul
dc.date.accessioned2018-03-01T07:55:36Z
dc.date.available2018-03-01T07:55:36Z
dc.date.issued2018-01-07eng
dc.description.versionpublishedeng
dc.identifier.doi10.1063/1.5011686eng
dc.identifier.urihttps://kops.uni-konstanz.de/handle/123456789/41645
dc.language.isoengeng
dc.subjectTransition; Nanoparticles; Semiconductors; Analytical chemistry; Secondary ion mass; spectroscopyeng
dc.subject.ddc530eng
dc.titleDynamic secondary ion mass spectroscopy of Au nanoparticles on Si wafer using Bi<sub>3</sub><sup>+</sup> as primary ion coupled with surface etching by Ar cluster ion beam : The effect of etching conditions on surface structureeng
dc.typeJOURNAL_ARTICLEeng
dspace.entity.typePublication
kops.citation.bibtex
@article{Park2018-01-07Dynam-41645,
  year={2018},
  doi={10.1063/1.5011686},
  title={Dynamic secondary ion mass spectroscopy of Au nanoparticles on Si wafer using Bi<sub>3</sub><sup>+</sup> as primary ion coupled with surface etching by Ar cluster ion beam : The effect of etching conditions on surface structure},
  number={1},
  volume={123},
  issn={0021-8979},
  journal={Journal of Applied Physics},
  author={Park, Eun Ji and Choi, Chang Min and Kim, Il Hee and Kim, Jung-Hwan and Lee, Gaehang and Jin, Jong Sung and Ganteför, Gerd and Kim, Young Dok and Choi, Myoung Choul},
  note={Article Number: 015303}
}
kops.citation.iso690PARK, Eun Ji, Chang Min CHOI, Il Hee KIM, Jung-Hwan KIM, Gaehang LEE, Jong Sung JIN, Gerd GANTEFÖR, Young Dok KIM, Myoung Choul CHOI, 2018. Dynamic secondary ion mass spectroscopy of Au nanoparticles on Si wafer using Bi3+ as primary ion coupled with surface etching by Ar cluster ion beam : The effect of etching conditions on surface structure. In: Journal of Applied Physics. 2018, 123(1), 015303. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.5011686deu
kops.citation.iso690PARK, Eun Ji, Chang Min CHOI, Il Hee KIM, Jung-Hwan KIM, Gaehang LEE, Jong Sung JIN, Gerd GANTEFÖR, Young Dok KIM, Myoung Choul CHOI, 2018. Dynamic secondary ion mass spectroscopy of Au nanoparticles on Si wafer using Bi3+ as primary ion coupled with surface etching by Ar cluster ion beam : The effect of etching conditions on surface structure. In: Journal of Applied Physics. 2018, 123(1), 015303. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.5011686eng
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