Wide-Range Structural and Chemical Stability of the Magnetic Oxide NiFe2O4 Grown by O2-Assisted Pulsed Laser Deposition

Kurzanzeige
dc.contributor.authorHoppe, Michael
dc.contributor.authorGorgoi, Mihaela
dc.contributor.authorSchneider, Claus M.
dc.contributor.authorMüller, Martina
dc.date.accessioned2020-05-27T09:08:06Z
dc.date.available2020-05-27T09:08:06Z
dc.date.issued2014-11eng
dc.description.abstractWe present a study of the structural and chemical properties of the magnetic insulator NiFe2O4 on conductive Nb-doped SrTiO3 (001) substrates. Special regard is given to the dependence of the thin film properties on the O2 :Ar ratio during pulsed laser deposition. Using stoichiometric NiFe2O4 target material and varying the O2 partial pressure from 0% to 100%, we find a nonzero oxygen threshold for heteroepitaxial growth and a stoichiometric Fe:Ni cation distribution. Moreover, our study clearly demonstrates that NiFe2O4 thin films grow with high quality over a wide range of oxygen partial pressures. These optimized NiFe2O4 /SrTiO3 heterostructures are envisioned as efficient spin filter tunnel contacts for room temperature application.eng
dc.description.versionpublishedeng
dc.identifier.doi10.1109/TMAG.2014.2322378eng
dc.identifier.urihttps://kops.uni-konstanz.de/handle/123456789/49670
dc.language.isoengeng
dc.rightsterms-of-use
dc.rights.urihttps://rightsstatements.org/page/InC/1.0/
dc.subject.ddc530eng
dc.titleWide-Range Structural and Chemical Stability of the Magnetic Oxide NiFe<sub>2</sub>O<sub>4</sub> Grown by O<sub>2</sub>-Assisted Pulsed Laser Depositioneng
dc.typeJOURNAL_ARTICLEeng
dspace.entity.typePublication
kops.citation.bibtex
@article{Hoppe2014-11WideR-49670,
  year={2014},
  doi={10.1109/TMAG.2014.2322378},
  title={Wide-Range Structural and Chemical Stability of the Magnetic Oxide NiFe<sub>2</sub>O<sub>4</sub> Grown by O<sub>2</sub>-Assisted Pulsed Laser Deposition},
  number={11},
  volume={50},
  issn={0018-9464},
  journal={IEEE Transactions on Magnetics},
  author={Hoppe, Michael and Gorgoi, Mihaela and Schneider, Claus M. and Müller, Martina},
  note={Article Number: 2506204}
}
kops.citation.iso690HOPPE, Michael, Mihaela GORGOI, Claus M. SCHNEIDER, Martina MÜLLER, 2014. Wide-Range Structural and Chemical Stability of the Magnetic Oxide NiFe2O4 Grown by O2-Assisted Pulsed Laser Deposition. In: IEEE Transactions on Magnetics. IEEE. 2014, 50(11), 2506204. ISSN 0018-9464. eISSN 1941-0069. Available under: doi: 10.1109/TMAG.2014.2322378deu
kops.citation.iso690HOPPE, Michael, Mihaela GORGOI, Claus M. SCHNEIDER, Martina MÜLLER, 2014. Wide-Range Structural and Chemical Stability of the Magnetic Oxide NiFe2O4 Grown by O2-Assisted Pulsed Laser Deposition. In: IEEE Transactions on Magnetics. IEEE. 2014, 50(11), 2506204. ISSN 0018-9464. eISSN 1941-0069. Available under: doi: 10.1109/TMAG.2014.2322378eng
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    <dcterms:abstract xml:lang="eng">We present a study of the structural and chemical properties of the magnetic insulator NiFe&lt;sub&gt;2&lt;/sub&gt;O&lt;sub&gt;4&lt;/sub&gt; on conductive Nb-doped SrTiO&lt;sub&gt;3&lt;/sub&gt; (001) substrates. Special regard is given to the dependence of the thin film properties on the O&lt;sub&gt;2&lt;/sub&gt; :Ar ratio during pulsed laser deposition. Using stoichiometric NiFe&lt;sub&gt;2&lt;/sub&gt;O&lt;sub&gt;4&lt;/sub&gt; target material and varying the O&lt;sub&gt;2&lt;/sub&gt; partial pressure from 0% to 100%, we find a nonzero oxygen threshold for heteroepitaxial growth and a stoichiometric Fe:Ni cation distribution. Moreover, our study clearly demonstrates that NiFe&lt;sub&gt;2&lt;/sub&gt;O&lt;sub&gt;4&lt;/sub&gt; thin films grow with high quality over a wide range of oxygen partial pressures. These optimized NiFe&lt;sub&gt;2&lt;/sub&gt;O&lt;sub&gt;4&lt;/sub&gt; /SrTiO&lt;sub&gt;3&lt;/sub&gt; heterostructures are envisioned as efficient spin filter tunnel contacts for room temperature application.</dcterms:abstract>
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kops.sourcefieldIEEE Transactions on Magnetics. IEEE. 2014, <b>50</b>(11), 2506204. ISSN 0018-9464. eISSN 1941-0069. Available under: doi: 10.1109/TMAG.2014.2322378deu
kops.sourcefield.plainIEEE Transactions on Magnetics. IEEE. 2014, 50(11), 2506204. ISSN 0018-9464. eISSN 1941-0069. Available under: doi: 10.1109/TMAG.2014.2322378deu
kops.sourcefield.plainIEEE Transactions on Magnetics. IEEE. 2014, 50(11), 2506204. ISSN 0018-9464. eISSN 1941-0069. Available under: doi: 10.1109/TMAG.2014.2322378eng
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source.bibliographicInfo.articleNumber2506204eng
source.bibliographicInfo.issue11eng
source.bibliographicInfo.volume50eng
source.identifier.eissn1941-0069eng
source.identifier.issn0018-9464eng
source.periodicalTitleIEEE Transactions on Magneticseng
source.publisherIEEEeng

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