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Wide-Range Structural and Chemical Stability of the Magnetic Oxide NiFe2O4 Grown by O2-Assisted Pulsed Laser Deposition

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2014

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Hoppe, Michael
Gorgoi, Mihaela
Schneider, Claus M.

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IEEE Transactions on Magnetics. IEEE. 2014, 50(11), 2506204. ISSN 0018-9464. eISSN 1941-0069. Available under: doi: 10.1109/TMAG.2014.2322378

Zusammenfassung

We present a study of the structural and chemical properties of the magnetic insulator NiFe2O4 on conductive Nb-doped SrTiO3 (001) substrates. Special regard is given to the dependence of the thin film properties on the O2 :Ar ratio during pulsed laser deposition. Using stoichiometric NiFe2O4 target material and varying the O2 partial pressure from 0% to 100%, we find a nonzero oxygen threshold for heteroepitaxial growth and a stoichiometric Fe:Ni cation distribution. Moreover, our study clearly demonstrates that NiFe2O4 thin films grow with high quality over a wide range of oxygen partial pressures. These optimized NiFe2O4 /SrTiO3 heterostructures are envisioned as efficient spin filter tunnel contacts for room temperature application.

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ISO 690HOPPE, Michael, Mihaela GORGOI, Claus M. SCHNEIDER, Martina MÜLLER, 2014. Wide-Range Structural and Chemical Stability of the Magnetic Oxide NiFe2O4 Grown by O2-Assisted Pulsed Laser Deposition. In: IEEE Transactions on Magnetics. IEEE. 2014, 50(11), 2506204. ISSN 0018-9464. eISSN 1941-0069. Available under: doi: 10.1109/TMAG.2014.2322378
BibTex
@article{Hoppe2014-11WideR-49670,
  year={2014},
  doi={10.1109/TMAG.2014.2322378},
  title={Wide-Range Structural and Chemical Stability of the Magnetic Oxide NiFe<sub>2</sub>O<sub>4</sub> Grown by O<sub>2</sub>-Assisted Pulsed Laser Deposition},
  number={11},
  volume={50},
  issn={0018-9464},
  journal={IEEE Transactions on Magnetics},
  author={Hoppe, Michael and Gorgoi, Mihaela and Schneider, Claus M. and Müller, Martina},
  note={Article Number: 2506204}
}
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    <dcterms:abstract xml:lang="eng">We present a study of the structural and chemical properties of the magnetic insulator NiFe&lt;sub&gt;2&lt;/sub&gt;O&lt;sub&gt;4&lt;/sub&gt; on conductive Nb-doped SrTiO&lt;sub&gt;3&lt;/sub&gt; (001) substrates. Special regard is given to the dependence of the thin film properties on the O&lt;sub&gt;2&lt;/sub&gt; :Ar ratio during pulsed laser deposition. Using stoichiometric NiFe&lt;sub&gt;2&lt;/sub&gt;O&lt;sub&gt;4&lt;/sub&gt; target material and varying the O&lt;sub&gt;2&lt;/sub&gt; partial pressure from 0% to 100%, we find a nonzero oxygen threshold for heteroepitaxial growth and a stoichiometric Fe:Ni cation distribution. Moreover, our study clearly demonstrates that NiFe&lt;sub&gt;2&lt;/sub&gt;O&lt;sub&gt;4&lt;/sub&gt; thin films grow with high quality over a wide range of oxygen partial pressures. These optimized NiFe&lt;sub&gt;2&lt;/sub&gt;O&lt;sub&gt;4&lt;/sub&gt; /SrTiO&lt;sub&gt;3&lt;/sub&gt; heterostructures are envisioned as efficient spin filter tunnel contacts for room temperature application.</dcterms:abstract>
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