Pulsed Laser Interference Lithography : Principles and Applications

dc.contributor.authorRiedel, Stephen
dc.contributor.authorGeldhauser, Tobias
dc.contributor.authorScheer, Elke
dc.contributor.authorLeiderer, Paul
dc.contributor.authorEnderle, F.deu
dc.contributor.authorPlettl, Alfreddeu
dc.contributor.authorBoneberg, Johannes
dc.date.accessioned2014-03-05T20:40:33Zdeu
dc.date.available2014-03-05T20:40:33Zdeu
dc.date.issued2013deu
dc.description.versionpublished
dc.identifier.citationAdvances in nanotechnology - physics, chemistry, and biology of nanostructures : results of the third research programme Kompetenznetz "Funktionelle Nanostrukturen" (Competence Network on Functional Nanostructures) / Thomas Schimmel ... (Hrgs.). - Stuttgart : Baden-Württemberg Stiftung, 2013. - S. 355-372. - ISBN 978-3-00-039257-3deu
dc.identifier.urihttp://kops.uni-konstanz.de/handle/123456789/26667
dc.language.isoengdeu
dc.legacy.dateIssued2014-03-05deu
dc.rightsterms-of-usedeu
dc.rights.urihttps://rightsstatements.org/page/InC/1.0/deu
dc.subject.ddc530deu
dc.titlePulsed Laser Interference Lithography : Principles and Applicationseng
dc.typeINCOLLECTIONdeu
dspace.entity.typePublication
kops.citation.bibtex
@incollection{Riedel2013Pulse-26667,
  year={2013},
  title={Pulsed Laser Interference Lithography : Principles and Applications},
  isbn={978-3-00-039257-3},
  publisher={Baden-Württemberg Stiftung},
  address={Stuttgart},
  booktitle={Advances in nanotechnology - physics, chemistry, and biology of nanostructures : results of the third research programme Kompetenznetz "Funktionelle Nanostrukturen "(Competence Network on Functional Nanostructures)},
  pages={355--372},
  editor={Schimmel, Thomas},
  author={Riedel, Stephen and Geldhauser, Tobias and Scheer, Elke and Leiderer, Paul and Enderle, F. and Plettl, Alfred and Boneberg, Johannes}
}
kops.citation.iso690RIEDEL, Stephen, Tobias GELDHAUSER, Elke SCHEER, Paul LEIDERER, F. ENDERLE, Alfred PLETTL, Johannes BONEBERG, 2013. Pulsed Laser Interference Lithography : Principles and Applications. In: SCHIMMEL, Thomas, ed. and others. Advances in nanotechnology - physics, chemistry, and biology of nanostructures : results of the third research programme Kompetenznetz "Funktionelle Nanostrukturen "(Competence Network on Functional Nanostructures). Stuttgart: Baden-Württemberg Stiftung, 2013, pp. 355-372. ISBN 978-3-00-039257-3deu
kops.citation.iso690RIEDEL, Stephen, Tobias GELDHAUSER, Elke SCHEER, Paul LEIDERER, F. ENDERLE, Alfred PLETTL, Johannes BONEBERG, 2013. Pulsed Laser Interference Lithography : Principles and Applications. In: SCHIMMEL, Thomas, ed. and others. Advances in nanotechnology - physics, chemistry, and biology of nanostructures : results of the third research programme Kompetenznetz "Funktionelle Nanostrukturen "(Competence Network on Functional Nanostructures). Stuttgart: Baden-Württemberg Stiftung, 2013, pp. 355-372. ISBN 978-3-00-039257-3eng
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kops.sourcefieldSCHIMMEL, Thomas, ed. and others. <i>Advances in nanotechnology - physics, chemistry, and biology of nanostructures : results of the third research programme Kompetenznetz "Funktionelle Nanostrukturen "(Competence Network on Functional Nanostructures)</i>. Stuttgart: Baden-Württemberg Stiftung, 2013, pp. 355-372. ISBN 978-3-00-039257-3deu
kops.sourcefield.plainSCHIMMEL, Thomas, ed. and others. Advances in nanotechnology - physics, chemistry, and biology of nanostructures : results of the third research programme Kompetenznetz "Funktionelle Nanostrukturen "(Competence Network on Functional Nanostructures). Stuttgart: Baden-Württemberg Stiftung, 2013, pp. 355-372. ISBN 978-3-00-039257-3deu
kops.sourcefield.plainSCHIMMEL, Thomas, ed. and others. Advances in nanotechnology - physics, chemistry, and biology of nanostructures : results of the third research programme Kompetenznetz "Funktionelle Nanostrukturen "(Competence Network on Functional Nanostructures). Stuttgart: Baden-Württemberg Stiftung, 2013, pp. 355-372. ISBN 978-3-00-039257-3eng
kops.submitter.emailjohannes.boneberg@uni-konstanz.dedeu
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