Nickel : A very fast diffuser in silicon

dc.contributor.authorLindroos, Jeanettedeu
dc.contributor.authorFenning, David P.deu
dc.contributor.authorBacklund, Daniel J.deu
dc.contributor.authorVerlage, Erikdeu
dc.contributor.authorGorgulla, Angelika
dc.contributor.authorEstreicher, Stefan K.deu
dc.contributor.authorSavin, Heledeu
dc.contributor.authorBuonassisi, Toniodeu
dc.date.accessioned2013-11-05T13:55:01Zdeu
dc.date.available2013-11-05T13:55:01Zdeu
dc.date.issued2013
dc.description.versionpublished
dc.identifier.citationJournal of Applied Physics ; 113 (2013), 20. - 204906deu
dc.identifier.doi10.1063/1.4807799deu
dc.identifier.urihttp://kops.uni-konstanz.de/handle/123456789/25036
dc.language.isoengdeu
dc.legacy.dateIssued2013-11-05deu
dc.rightsterms-of-usedeu
dc.rights.urihttps://rightsstatements.org/page/InC/1.0/deu
dc.subject.ddc530deu
dc.titleNickel : A very fast diffuser in siliconeng
dc.typeJOURNAL_ARTICLEdeu
dspace.entity.typePublication
kops.citation.bibtex
@article{Lindroos2013Nicke-25036,
  year={2013},
  doi={10.1063/1.4807799},
  title={Nickel : A very fast diffuser in silicon},
  number={20},
  volume={113},
  issn={0021-8979},
  journal={Journal of Applied Physics},
  author={Lindroos, Jeanette and Fenning, David P. and Backlund, Daniel J. and Verlage, Erik and Gorgulla, Angelika and Estreicher, Stefan K. and Savin, Hele and Buonassisi, Tonio},
  note={Article Number: 204906}
}
kops.citation.iso690LINDROOS, Jeanette, David P. FENNING, Daniel J. BACKLUND, Erik VERLAGE, Angelika GORGULLA, Stefan K. ESTREICHER, Hele SAVIN, Tonio BUONASSISI, 2013. Nickel : A very fast diffuser in silicon. In: Journal of Applied Physics. 2013, 113(20), 204906. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.4807799deu
kops.citation.iso690LINDROOS, Jeanette, David P. FENNING, Daniel J. BACKLUND, Erik VERLAGE, Angelika GORGULLA, Stefan K. ESTREICHER, Hele SAVIN, Tonio BUONASSISI, 2013. Nickel : A very fast diffuser in silicon. In: Journal of Applied Physics. 2013, 113(20), 204906. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.4807799eng
kops.citation.rdf
<rdf:RDF
    xmlns:dcterms="http://purl.org/dc/terms/"
    xmlns:dc="http://purl.org/dc/elements/1.1/"
    xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
    xmlns:bibo="http://purl.org/ontology/bibo/"
    xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
    xmlns:foaf="http://xmlns.com/foaf/0.1/"
    xmlns:void="http://rdfs.org/ns/void#"
    xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > 
  <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/25036">
    <dcterms:bibliographicCitation>Journal of Applied Physics ; 113 (2013), 20. - 204906</dcterms:bibliographicCitation>
    <dc:language>eng</dc:language>
    <dc:creator>Backlund, Daniel J.</dc:creator>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dc:creator>Estreicher, Stefan K.</dc:creator>
    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2013-11-05T13:55:01Z</dc:date>
    <dcterms:title>Nickel : A very fast diffuser in silicon</dcterms:title>
    <dc:creator>Savin, Hele</dc:creator>
    <dc:creator>Fenning, David P.</dc:creator>
    <dcterms:issued>2013</dcterms:issued>
    <dc:contributor>Backlund, Daniel J.</dc:contributor>
    <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
    <dcterms:rights rdf:resource="https://rightsstatements.org/page/InC/1.0/"/>
    <dc:contributor>Lindroos, Jeanette</dc:contributor>
    <dc:creator>Lindroos, Jeanette</dc:creator>
    <dc:contributor>Fenning, David P.</dc:contributor>
    <dc:contributor>Verlage, Erik</dc:contributor>
    <dc:creator>Gorgulla, Angelika</dc:creator>
    <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/25036"/>
    <dc:contributor>Savin, Hele</dc:contributor>
    <dc:creator>Verlage, Erik</dc:creator>
    <dc:rights>terms-of-use</dc:rights>
    <dc:creator>Buonassisi, Tonio</dc:creator>
    <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2013-11-05T13:55:01Z</dcterms:available>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dc:contributor>Estreicher, Stefan K.</dc:contributor>
    <foaf:homepage rdf:resource="http://localhost:8080/"/>
    <dc:contributor>Gorgulla, Angelika</dc:contributor>
    <dc:contributor>Buonassisi, Tonio</dc:contributor>
  </rdf:Description>
</rdf:RDF>
kops.flag.knbibliographytrue
kops.identifier.nbnurn:nbn:de:bsz:352-250361deu
kops.sourcefieldJournal of Applied Physics. 2013, <b>113</b>(20), 204906. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.4807799deu
kops.sourcefield.plainJournal of Applied Physics. 2013, 113(20), 204906. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.4807799deu
kops.sourcefield.plainJournal of Applied Physics. 2013, 113(20), 204906. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.4807799eng
kops.submitter.emailsabine.gross-buitenwerf@uni-konstanz.dedeu
relation.isAuthorOfPublication03d24a95-f420-4f92-937f-55b35935e456
relation.isAuthorOfPublication.latestForDiscovery03d24a95-f420-4f92-937f-55b35935e456
source.bibliographicInfo.articleNumber204906
source.bibliographicInfo.issue20
source.bibliographicInfo.volume113
source.identifier.eissn1089-7550deu
source.identifier.issn0021-8979
source.periodicalTitleJournal of Applied Physics

Dateien

Lizenzbündel

Gerade angezeigt 1 - 1 von 1
Vorschaubild nicht verfügbar
Name:
license.txt
Größe:
1.92 KB
Format:
Plain Text
Beschreibung:
license.txt
license.txtGröße: 1.92 KBDownloads: 0