Nickel : A very fast diffuser in silicon
| dc.contributor.author | Lindroos, Jeanette | deu |
| dc.contributor.author | Fenning, David P. | deu |
| dc.contributor.author | Backlund, Daniel J. | deu |
| dc.contributor.author | Verlage, Erik | deu |
| dc.contributor.author | Gorgulla, Angelika | |
| dc.contributor.author | Estreicher, Stefan K. | deu |
| dc.contributor.author | Savin, Hele | deu |
| dc.contributor.author | Buonassisi, Tonio | deu |
| dc.date.accessioned | 2013-11-05T13:55:01Z | deu |
| dc.date.available | 2013-11-05T13:55:01Z | deu |
| dc.date.issued | 2013 | |
| dc.description.version | published | |
| dc.identifier.citation | Journal of Applied Physics ; 113 (2013), 20. - 204906 | deu |
| dc.identifier.doi | 10.1063/1.4807799 | deu |
| dc.identifier.uri | http://kops.uni-konstanz.de/handle/123456789/25036 | |
| dc.language.iso | eng | deu |
| dc.legacy.dateIssued | 2013-11-05 | deu |
| dc.rights | terms-of-use | deu |
| dc.rights.uri | https://rightsstatements.org/page/InC/1.0/ | deu |
| dc.subject.ddc | 530 | deu |
| dc.title | Nickel : A very fast diffuser in silicon | eng |
| dc.type | JOURNAL_ARTICLE | deu |
| dspace.entity.type | Publication | |
| kops.citation.bibtex | @article{Lindroos2013Nicke-25036,
year={2013},
doi={10.1063/1.4807799},
title={Nickel : A very fast diffuser in silicon},
number={20},
volume={113},
issn={0021-8979},
journal={Journal of Applied Physics},
author={Lindroos, Jeanette and Fenning, David P. and Backlund, Daniel J. and Verlage, Erik and Gorgulla, Angelika and Estreicher, Stefan K. and Savin, Hele and Buonassisi, Tonio},
note={Article Number: 204906}
} | |
| kops.citation.iso690 | LINDROOS, Jeanette, David P. FENNING, Daniel J. BACKLUND, Erik VERLAGE, Angelika GORGULLA, Stefan K. ESTREICHER, Hele SAVIN, Tonio BUONASSISI, 2013. Nickel : A very fast diffuser in silicon. In: Journal of Applied Physics. 2013, 113(20), 204906. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.4807799 | deu |
| kops.citation.iso690 | LINDROOS, Jeanette, David P. FENNING, Daniel J. BACKLUND, Erik VERLAGE, Angelika GORGULLA, Stefan K. ESTREICHER, Hele SAVIN, Tonio BUONASSISI, 2013. Nickel : A very fast diffuser in silicon. In: Journal of Applied Physics. 2013, 113(20), 204906. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.4807799 | eng |
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| kops.sourcefield.plain | Journal of Applied Physics. 2013, 113(20), 204906. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.4807799 | eng |
| kops.submitter.email | sabine.gross-buitenwerf@uni-konstanz.de | deu |
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