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Dynamic secondary ion mass spectroscopy of Au nanoparticles on Si wafer using Bi<sub>3</sub><sup>+</sup> as primary ion coupled with surface etching by Ar cluster ion beam : The effect of etching conditions on surface structure

Dynamic secondary ion mass spectroscopy of Au nanoparticles on Si wafer using Bi3+ as primary ion coupled with surface etching by Ar cluster ion beam : The effect of etching conditions on surface structure

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PARK, Eun Ji, Chang Min CHOI, Il Hee KIM, Jung-Hwan KIM, Gaehang LEE, Jong Sung JIN, Gerd GANTEFÖR, Young Dok KIM, Myoung Choul CHOI, 2018. Dynamic secondary ion mass spectroscopy of Au nanoparticles on Si wafer using Bi3+ as primary ion coupled with surface etching by Ar cluster ion beam : The effect of etching conditions on surface structure. In: Journal of Applied Physics. 123(1), 015303. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.5011686

@article{Park2018-01-07Dynam-41645, title={Dynamic secondary ion mass spectroscopy of Au nanoparticles on Si wafer using Bi3+ as primary ion coupled with surface etching by Ar cluster ion beam : The effect of etching conditions on surface structure}, year={2018}, doi={10.1063/1.5011686}, number={1}, volume={123}, issn={0021-8979}, journal={Journal of Applied Physics}, author={Park, Eun Ji and Choi, Chang Min and Kim, Il Hee and Kim, Jung-Hwan and Lee, Gaehang and Jin, Jong Sung and Ganteför, Gerd and Kim, Young Dok and Choi, Myoung Choul}, note={Article Number: 015303} }

Dynamic secondary ion mass spectroscopy of Au nanoparticles on Si wafer using Bi<sub>3</sub><sup>+</sup> as primary ion coupled with surface etching by Ar cluster ion beam : The effect of etching conditions on surface structure Choi, Myoung Choul Kim, Jung-Hwan Choi, Chang Min eng Lee, Gaehang Choi, Chang Min Park, Eun Ji Kim, Young Dok 2018-01-07 Park, Eun Ji Ganteför, Gerd Choi, Myoung Choul Kim, Il Hee Ganteför, Gerd Kim, Il Hee 2018-03-01T07:55:36Z Kim, Jung-Hwan 2018-03-01T07:55:36Z Jin, Jong Sung Jin, Jong Sung Kim, Young Dok Lee, Gaehang

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