Publikation: Dynamic secondary ion mass spectroscopy of Au nanoparticles on Si wafer using Bi3+ as primary ion coupled with surface etching by Ar cluster ion beam : The effect of etching conditions on surface structure
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Datum
2018
Autor:innen
Park, Eun Ji
Choi, Chang Min
Kim, Il Hee
Kim, Jung-Hwan
Lee, Gaehang
Jin, Jong Sung
Kim, Young Dok
Choi, Myoung Choul
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Journal of Applied Physics. 2018, 123(1), 015303. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.5011686
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530 Physik
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Transition; Nanoparticles; Semiconductors; Analytical chemistry; Secondary ion mass; spectroscopy
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PARK, Eun Ji, Chang Min CHOI, Il Hee KIM, Jung-Hwan KIM, Gaehang LEE, Jong Sung JIN, Gerd GANTEFÖR, Young Dok KIM, Myoung Choul CHOI, 2018. Dynamic secondary ion mass spectroscopy of Au nanoparticles on Si wafer using Bi3+ as primary ion coupled with surface etching by Ar cluster ion beam : The effect of etching conditions on surface structure. In: Journal of Applied Physics. 2018, 123(1), 015303. ISSN 0021-8979. eISSN 1089-7550. Available under: doi: 10.1063/1.5011686BibTex
@article{Park2018-01-07Dynam-41645,
year={2018},
doi={10.1063/1.5011686},
title={Dynamic secondary ion mass spectroscopy of Au nanoparticles on Si wafer using Bi<sub>3</sub><sup>+</sup> as primary ion coupled with surface etching by Ar cluster ion beam : The effect of etching conditions on surface structure},
number={1},
volume={123},
issn={0021-8979},
journal={Journal of Applied Physics},
author={Park, Eun Ji and Choi, Chang Min and Kim, Il Hee and Kim, Jung-Hwan and Lee, Gaehang and Jin, Jong Sung and Ganteför, Gerd and Kim, Young Dok and Choi, Myoung Choul},
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