A comparison of ns and ps steam laser cleaning of Si surfaces

Kurzanzeige
dc.contributor.authorMosbacher, Mario
dc.contributor.authorChaoui, Nouarideu
dc.contributor.authorSiegel, Jan Philipdeu
dc.contributor.authorDobler, Volkerdeu
dc.contributor.authorSolis Cespedes, Francisco Javierdeu
dc.contributor.authorBoneberg, Johannes
dc.contributor.authorAfonso Rodriguez, Carmen Nievesdeu
dc.contributor.authorLeiderer, Paul
dc.date.accessioned2011-03-24T17:55:51Zdeu
dc.date.available2011-03-24T17:55:51Zdeu
dc.date.issued1999deu
dc.description.abstractWe report a quantitative investigation on the efficiency of the steam laser cleaning process using ns and ps pulses. Well-characterized polymer particles with a diameter of 800 nm dispersed on commercial Si wafers were chosen as a modeling contaminant system. As a result of our investigation, we show for the first time the feasibility of performing efficient steam laser cleaning with ps laser pulses and compare the achieved efficiency with the one obtained for ns pulses. For ns pulses, we found a cleaning fluence threshold of 50 mJ/cm2 that is independent of the pulse durations (2.5 ns and 8 ns) and the wavelengths (532 nm and 583 nm) used. The application of ps pulses (FWHM=30 ps, h=583 nm) lowered this threshold to 20 mJ/cm2. Both cleaning thresholds are far below the melting thresholds for these laser parameters. Cleaning efficiencies > 90% were reached for both pulse durations.eng
dc.description.versionpublished
dc.format.mimetypeapplication/pdfdeu
dc.identifier.citationFirst publ. in: Applied Physics / A, Materials Science and Processing, 69 (1999), Supplement 1, pp. S331 S334deu
dc.identifier.doi10.1007/s003390051411
dc.identifier.ppn26507407Xdeu
dc.identifier.urihttp://kops.uni-konstanz.de/handle/123456789/9362
dc.language.isoengdeu
dc.legacy.dateIssued2007deu
dc.rightsAttribution-NonCommercial-NoDerivs 2.0 Generic
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/
dc.subject.ddc530deu
dc.titleA comparison of ns and ps steam laser cleaning of Si surfaceseng
dc.typeJOURNAL_ARTICLEdeu
dspace.entity.typePublication
kops.citation.bibtex
@article{Mosbacher1999compa-9362,
  year={1999},
  doi={10.1007/s003390051411},
  title={A comparison of ns and ps steam laser cleaning of Si surfaces},
  number={Supplement 1},
  volume={69},
  journal={Applied Physics / A, Materials Science and Processing},
  pages={S331--S334},
  author={Mosbacher, Mario and Chaoui, Nouari and Siegel, Jan Philip and Dobler, Volker and Solis Cespedes, Francisco Javier and Boneberg, Johannes and Afonso Rodriguez, Carmen Nieves and Leiderer, Paul}
}
kops.citation.iso690MOSBACHER, Mario, Nouari CHAOUI, Jan Philip SIEGEL, Volker DOBLER, Francisco Javier SOLIS CESPEDES, Johannes BONEBERG, Carmen Nieves AFONSO RODRIGUEZ, Paul LEIDERER, 1999. A comparison of ns and ps steam laser cleaning of Si surfaces. In: Applied Physics / A, Materials Science and Processing. 1999, 69(Supplement 1), pp. S331-S334. Available under: doi: 10.1007/s003390051411deu
kops.citation.iso690MOSBACHER, Mario, Nouari CHAOUI, Jan Philip SIEGEL, Volker DOBLER, Francisco Javier SOLIS CESPEDES, Johannes BONEBERG, Carmen Nieves AFONSO RODRIGUEZ, Paul LEIDERER, 1999. A comparison of ns and ps steam laser cleaning of Si surfaces. In: Applied Physics / A, Materials Science and Processing. 1999, 69(Supplement 1), pp. S331-S334. Available under: doi: 10.1007/s003390051411eng
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kops.sourcefieldApplied Physics / A, Materials Science and Processing. 1999, <b>69</b>(Supplement 1), pp. S331-S334. Available under: doi: 10.1007/s003390051411deu
kops.sourcefield.plainApplied Physics / A, Materials Science and Processing. 1999, 69(Supplement 1), pp. S331-S334. Available under: doi: 10.1007/s003390051411deu
kops.sourcefield.plainApplied Physics / A, Materials Science and Processing. 1999, 69(Supplement 1), pp. S331-S334. Available under: doi: 10.1007/s003390051411eng
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