Formation of Ag/Al Screen-Printing Contacts on B Emitters
| dc.contributor.author | Fritz, Susanne | |
| dc.contributor.author | König, Markus | |
| dc.contributor.author | Ebert, Stefanie | |
| dc.contributor.author | Herguth, Axel | |
| dc.contributor.author | Hörteis, Matthias | |
| dc.contributor.author | Hahn, Giso | |
| dc.date.accessioned | 2015-04-02T08:50:44Z | |
| dc.date.available | 2015-04-02T08:50:44Z | |
| dc.date.issued | 2015 | eng |
| dc.description.abstract | In this study, the contact formation process of Al containing Ag screen-printing pastes to BBr3-based B emitters on Si is investigated. Therefore, a detailed scanning electron microscopy (SEM) and energy-dispersive X-ray spectroscopy study of top-view and cross-sectional samples was conducted. The possible influence of a SiN∞:H antireflection coating was considered by comparing contacts with and without a SiN∞:H layer. To analyze the role of the glass frit in the paste, the contact formation of pastes without glass was examined. The results indicate that the Ag/Al contact spots grow below the Si surface/SiN∞:H layer. The glass frit is only indispensable for etching the antireflection layer-it is not needed for melting the metal in the screen-printing paste. The realized experiments lead to a phenomenological model for the contact formation process of Al containing screen-printing pastes to boron emitters. | eng |
| dc.description.version | published | |
| dc.identifier.doi | 10.1109/JPHOTOV.2014.2364117 | eng |
| dc.identifier.ppn | 45765354X | |
| dc.identifier.uri | http://kops.uni-konstanz.de/handle/123456789/30648 | |
| dc.language.iso | eng | eng |
| dc.rights | terms-of-use | |
| dc.rights.uri | https://rightsstatements.org/page/InC/1.0/ | |
| dc.subject | Boron emitters, contact formation, metallization, p+Si, scanning electron microscopy (SEM), screen-printing | eng |
| dc.subject.ddc | 530 | eng |
| dc.title | Formation of Ag/Al Screen-Printing Contacts on B Emitters | eng |
| dc.type | JOURNAL_ARTICLE | eng |
| dspace.entity.type | Publication | |
| kops.citation.bibtex | @article{Fritz2015Forma-30648,
year={2015},
doi={10.1109/JPHOTOV.2014.2364117},
title={Formation of Ag/Al Screen-Printing Contacts on B Emitters},
number={1},
volume={5},
journal={IEEE Journal of Photovoltaics},
pages={145--151},
author={Fritz, Susanne and König, Markus and Ebert, Stefanie and Herguth, Axel and Hörteis, Matthias and Hahn, Giso}
} | |
| kops.citation.iso690 | FRITZ, Susanne, Markus KÖNIG, Stefanie EBERT, Axel HERGUTH, Matthias HÖRTEIS, Giso HAHN, 2015. Formation of Ag/Al Screen-Printing Contacts on B Emitters. In: IEEE Journal of Photovoltaics. 2015, 5(1), pp. 145-151. eISSN 2156-3381. Available under: doi: 10.1109/JPHOTOV.2014.2364117 | deu |
| kops.citation.iso690 | FRITZ, Susanne, Markus KÖNIG, Stefanie EBERT, Axel HERGUTH, Matthias HÖRTEIS, Giso HAHN, 2015. Formation of Ag/Al Screen-Printing Contacts on B Emitters. In: IEEE Journal of Photovoltaics. 2015, 5(1), pp. 145-151. eISSN 2156-3381. Available under: doi: 10.1109/JPHOTOV.2014.2364117 | eng |
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<dcterms:abstract xml:lang="eng">In this study, the contact formation process of Al containing Ag screen-printing pastes to BBr3-based B emitters on Si is investigated. Therefore, a detailed scanning electron microscopy (SEM) and energy-dispersive X-ray spectroscopy study of top-view and cross-sectional samples was conducted. The possible influence of a SiN<sub>∞</sub>:H antireflection coating was considered by comparing contacts with and without a SiN<sub>∞</sub>:H layer. To analyze the role of the glass frit in the paste, the contact formation of pastes without glass was examined. The results indicate that the Ag/Al contact spots grow below the Si surface/SiN<sub>∞</sub>:H layer. The glass frit is only indispensable for etching the antireflection layer-it is not needed for melting the metal in the screen-printing paste. The realized experiments lead to a phenomenological model for the contact formation process of Al containing screen-printing pastes to boron emitters.</dcterms:abstract>
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| kops.sourcefield | IEEE Journal of Photovoltaics. 2015, <b>5</b>(1), pp. 145-151. eISSN 2156-3381. Available under: doi: 10.1109/JPHOTOV.2014.2364117 | deu |
| kops.sourcefield.plain | IEEE Journal of Photovoltaics. 2015, 5(1), pp. 145-151. eISSN 2156-3381. Available under: doi: 10.1109/JPHOTOV.2014.2364117 | deu |
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| source.bibliographicInfo.fromPage | 145 | eng |
| source.bibliographicInfo.issue | 1 | eng |
| source.bibliographicInfo.toPage | 151 | eng |
| source.bibliographicInfo.volume | 5 | eng |
| source.identifier.eissn | 2156-3381 | eng |
| source.periodicalTitle | IEEE Journal of Photovoltaics | eng |
| temp.internal.duplicates | <p>Keine Dubletten gefunden. Letzte Überprüfung: 13.02.2015 09:27:18</p> | deu |
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