Equilibrium helium film in the thick film limit

Loading...
Thumbnail Image
Date
2003
Authors
Klier, Jürgen
Schletterer, Frank
Shikin, Valeri
Editors
Contact
Journal ISSN
Electronic ISSN
ISBN
Bibliographical data
Publisher
Series
DOI (citable link)
ArXiv-ID
International patent number
EU project number
Project
Open Access publication
Collections
Restricted until
Title in another language
Research Projects
Organizational Units
Journal Issue
Publication type
Journal article
Publication status
Published in
Fizika Nizkikh Temperatur ; 29 (2003), 9-10. - pp. 957-960
Abstract
For the thickness of a liquid or solid quantum film, like liquid helium or solid hydrogen, there exist still open questions about how the film thickness develops in certain limits. One of these is the thick film limit, i.e., the crossover from the thick film to bulk. We have performed measurements in this range using the surface plasmon resonance technique and an evaporated Ag film deposited on glass as substrate. The thickness of the adsorhed helium film is varied by changing the distance h of the bulk reservoir to the surface of the substrate. In the limiting case, when h -> 0, the film thickness approaches about 100 nm following the wan der Waals law in thc retarded regime. The film thickness and its dependence on h is precisely determined and theoretically modeled. The equilibrium film thickness behaviour is discussed in detail. The agreement between theory and experiment is very good.
Summary in another language
Subject (DDC)
530 Physics
Keywords
Conference
Review
undefined / . - undefined, undefined. - (undefined; undefined)
Cite This
ISO 690KLIER, Jürgen, Frank SCHLETTERER, Paul LEIDERER, Valeri SHIKIN, 2003. Equilibrium helium film in the thick film limit. In: Fizika Nizkikh Temperatur. 29(9-10), pp. 957-960
BibTex
@article{Klier2003Equil-5010,
  year={2003},
  title={Equilibrium helium film in the thick film limit},
  number={9-10},
  volume={29},
  journal={Fizika Nizkikh Temperatur},
  pages={957--960},
  author={Klier, Jürgen and Schletterer, Frank and Leiderer, Paul and Shikin, Valeri}
}
RDF
<rdf:RDF
    xmlns:dcterms="http://purl.org/dc/terms/"
    xmlns:dc="http://purl.org/dc/elements/1.1/"
    xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
    xmlns:bibo="http://purl.org/ontology/bibo/"
    xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
    xmlns:foaf="http://xmlns.com/foaf/0.1/"
    xmlns:void="http://rdfs.org/ns/void#"
    xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > 
  <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/5010">
    <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:52:28Z</dcterms:available>
    <dc:creator>Klier, Jürgen</dc:creator>
    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:52:28Z</dc:date>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dc:language>eng</dc:language>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/5010"/>
    <dcterms:bibliographicCitation>First publ. in: Fizika Nizkikh Temperatur 29 (2003), 9-10, pp. 957-960</dcterms:bibliographicCitation>
    <dc:contributor>Leiderer, Paul</dc:contributor>
    <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/5010/1/325_lowtempphys_2003.pdf"/>
    <dc:contributor>Shikin, Valeri</dc:contributor>
    <dc:rights>Attribution-NonCommercial-NoDerivs 2.0 Generic</dc:rights>
    <dc:format>application/pdf</dc:format>
    <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/5010/1/325_lowtempphys_2003.pdf"/>
    <dc:contributor>Klier, Jürgen</dc:contributor>
    <dc:creator>Schletterer, Frank</dc:creator>
    <dc:creator>Shikin, Valeri</dc:creator>
    <dc:creator>Leiderer, Paul</dc:creator>
    <dcterms:issued>2003</dcterms:issued>
    <dc:contributor>Schletterer, Frank</dc:contributor>
    <dcterms:abstract xml:lang="eng">For the thickness of a liquid or solid quantum film, like liquid helium or solid hydrogen, there exist still open questions about how the film thickness develops in certain limits. One of these is the thick film limit, i.e., the crossover from the thick film to bulk. We have performed measurements in this range using the surface plasmon resonance technique and an evaporated Ag film deposited on glass as substrate. The thickness of the adsorhed helium film is varied by changing the distance h of the bulk reservoir to the surface of the substrate. In the limiting case, when h -&gt; 0, the film thickness approaches about 100 nm following the wan der Waals law in thc retarded regime. The film thickness and its dependence on h is precisely determined and theoretically modeled. The equilibrium film thickness behaviour is discussed in detail. The agreement between theory and experiment is very good.</dcterms:abstract>
    <dcterms:title>Equilibrium helium film in the thick film limit</dcterms:title>
    <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
    <foaf:homepage rdf:resource="http://localhost:8080/"/>
    <dcterms:rights rdf:resource="http://creativecommons.org/licenses/by-nc-nd/2.0/"/>
  </rdf:Description>
</rdf:RDF>
Internal note
xmlui.Submission.submit.DescribeStep.inputForms.label.kops_note_fromSubmitter
Contact
URL of original publication
Test date of URL
Examination date of dissertation
Method of financing
Comment on publication
Alliance license
Corresponding Authors der Uni Konstanz vorhanden
International Co-Authors
Bibliography of Konstanz
Yes
Refereed