Publikation:

Charge transfer in copper oxide thin films deposited at different electrodeposition potential

Vorschaubild

Dateien

Zu diesem Dokument gibt es keine Dateien.

Datum

2023

Autor:innen

Ali, Nazakat
Waqas, Muhammad
Faheem, M.
Ahmad, Naveed
Ali, Adnan
Ali, Muhammad Yasir
Mahmood, Khalid

Herausgeber:innen

Kontakt

ISSN der Zeitschrift

Electronic ISSN

ISBN

Bibliografische Daten

Verlag

Schriftenreihe

Auflagebezeichnung

URI (zitierfähiger Link)
DOI (zitierfähiger Link)
https://doi.org/10.1016/j.physb.2023.414881
ArXiv-ID

Internationale Patentnummer

Angaben zur Forschungsförderung

Projekt

Open Access-Veröffentlichung

Sammlungen

Physik: Publikationen
Core Facility der Universität Konstanz

Gesperrt bis

Titel in einer weiteren Sprache

Publikationstyp
Zeitschriftenartikel
Publikationsstatus
Published

Erschienen in

Physica B: Condensed Matter. Elsevier. 2023, 659, 414881. ISSN 0921-4526. eISSN 1873-2135. Available under: doi: 10.1016/j.physb.2023.414881

Zusammenfassung

The deposition potential affects the structural, morphological, optical, and electrochemical impedance spectroscopy properties of cuprous oxide (Cu2O) thin films formed on copper (Cu) substrates adopting a three-electrode electrochemical deposition procedure. XRD data revealed that the deposited films have a cubic structure established with desired (111) growth orientation. Scanning electron microscopy (SEM) images reveal that Cu2O film has very well three-sided pyramid-shaped grains which are equally spread over the surface of the Cu substrates and change substantially when the plating potential is changed. The photo-current density of prepared Cu2O thin films was increased from −1.41 × 10−4 to −3.01 × 10−4 A/cm2 with increasing the deposition potential of −0.3 to −0.6 V, respectively. Further, Cu2O thin films obtained at −0.6 V have the minimum charge transfer resistance (Rct) than Cu2O thin films synthesized at −0.3 to −0.5 V, suggesting that Cu2O thin films produced at −0.6 V have the highest electron transfer efficiency.

Zusammenfassung in einer weiteren Sprache

Fachgebiet (DDC)
530 Physik

Schlagwörter

Konferenz

Rezension
undefined / . - undefined, undefined

Forschungsvorhaben

Organisationseinheiten

Zeitschriftenheft

Zugehörige Datensätze in KOPS

Zitieren

ISO 690ALI, Nazakat, Sajad HUSSAIN, Muhammad WAQAS, M. FAHEEM, Naveed AHMAD, Adnan ALI, Muhammad Yasir ALI, Khalid MAHMOOD, Lukas SCHMIDT-MENDE, 2023. Charge transfer in copper oxide thin films deposited at different electrodeposition potential. In: Physica B: Condensed Matter. Elsevier. 2023, 659, 414881. ISSN 0921-4526. eISSN 1873-2135. Available under: doi: 10.1016/j.physb.2023.414881
BibTex
@article{Ali2023Charg-66800,
  year={2023},
  doi={10.1016/j.physb.2023.414881},
  title={Charge transfer in copper oxide thin films deposited at different electrodeposition potential},
  volume={659},
  issn={0921-4526},
  journal={Physica B: Condensed Matter},
  author={Ali, Nazakat and Hussain, Sajad and Waqas, Muhammad and Faheem, M. and Ahmad, Naveed and Ali, Adnan and Ali, Muhammad Yasir and Mahmood, Khalid and Schmidt-Mende, Lukas},
  note={Article Number: 414881}
}
RDF
<rdf:RDF
    xmlns:dcterms="http://purl.org/dc/terms/"
    xmlns:dc="http://purl.org/dc/elements/1.1/"
    xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
    xmlns:bibo="http://purl.org/ontology/bibo/"
    xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
    xmlns:foaf="http://xmlns.com/foaf/0.1/"
    xmlns:void="http://rdfs.org/ns/void#"
    xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > 
  <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/66800">
    <dc:contributor>Ali, Adnan</dc:contributor>
    <dcterms:title>Charge transfer in copper oxide thin films deposited at different electrodeposition potential</dcterms:title>
    <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
    <dcterms:abstract>The deposition potential affects the structural, morphological, optical, and electrochemical impedance spectroscopy properties of cuprous oxide (Cu&lt;sub&gt;2&lt;/sub&gt;O) thin films formed on copper (Cu) substrates adopting a three-electrode electrochemical deposition procedure. XRD data revealed that the deposited films have a cubic structure established with desired (111) growth orientation. Scanning electron microscopy (SEM) images reveal that Cu&lt;sub&gt;2&lt;/sub&gt;O film has very well three-sided pyramid-shaped grains which are equally spread over the surface of the Cu substrates and change substantially when the plating potential is changed. The photo-current density of prepared Cu&lt;sub&gt;2&lt;/sub&gt;O thin films was increased from −1.41 × 10&lt;sup&gt;−4&lt;/sup&gt; to −3.01 × 10&lt;sup&gt;−4&lt;/sup&gt; A/cm&lt;sup&gt;2&lt;/sup&gt; with increasing the deposition potential of −0.3 to −0.6 V, respectively. Further, Cu&lt;sub&gt;2&lt;/sub&gt;O thin films obtained at −0.6 V have the minimum charge transfer resistance (R&lt;sub&gt;ct&lt;/sub&gt;) than Cu&lt;sub&gt;2&lt;/sub&gt;O thin films synthesized at −0.3 to −0.5 V, suggesting that Cu&lt;sub&gt;2&lt;/sub&gt;O thin films produced at −0.6 V have the highest electron transfer efficiency.</dcterms:abstract>
    <dc:creator>Ali, Nazakat</dc:creator>
    <dc:creator>Ali, Adnan</dc:creator>
    <dc:creator>Ali, Muhammad Yasir</dc:creator>
    <dc:contributor>Schmidt-Mende, Lukas</dc:contributor>
    <dc:creator>Mahmood, Khalid</dc:creator>
    <dc:contributor>Mahmood, Khalid</dc:contributor>
    <dc:creator>Faheem, M.</dc:creator>
    <dc:contributor>Ali, Muhammad Yasir</dc:contributor>
    <dc:contributor>Faheem, M.</dc:contributor>
    <dc:language>eng</dc:language>
    <dcterms:issued>2023</dcterms:issued>
    <dc:creator>Ahmad, Naveed</dc:creator>
    <dc:contributor>Ahmad, Naveed</dc:contributor>
    <dc:contributor>Ali, Nazakat</dc:contributor>
    <bibo:uri rdf:resource="https://kops.uni-konstanz.de/handle/123456789/66800"/>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <foaf:homepage rdf:resource="http://localhost:8080/"/>
    <dc:creator>Hussain, Sajad</dc:creator>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dc:contributor>Hussain, Sajad</dc:contributor>
    <dc:creator>Schmidt-Mende, Lukas</dc:creator>
    <dc:creator>Waqas, Muhammad</dc:creator>
    <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2023-05-05T12:52:08Z</dcterms:available>
    <dc:contributor>Waqas, Muhammad</dc:contributor>
    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2023-05-05T12:52:08Z</dc:date>
  </rdf:Description>
</rdf:RDF>

Interner Vermerk

xmlui.Submission.submit.DescribeStep.inputForms.label.kops_note_fromSubmitter

Kontakt
URL der Originalveröffentl.

Prüfdatum der URL

Prüfungsdatum der Dissertation

Finanzierungsart

Kommentar zur Publikation

Allianzlizenz
Corresponding Authors der Uni Konstanz vorhanden
Internationale Co-Autor:innen
Universitätsbibliographie
Ja
Begutachtet
Unbekannt
Diese Publikation teilen