Charge transfer in copper oxide thin films deposited at different electrodeposition potential
Charge transfer in copper oxide thin films deposited at different electrodeposition potential
Vorschaubild nicht verfügbar
Dateien
Zu diesem Dokument gibt es keine Dateien.
Datum
2023
Autor:innen
Ali, Nazakat
Waqas, Muhammad
Faheem, M.
Ahmad, Naveed
Ali, Adnan
Ali, Muhammad Yasir
Mahmood, Khalid
Herausgeber:innen
ISSN der Zeitschrift
eISSN
item.preview.dc.identifier.isbn
Bibliografische Daten
Verlag
Schriftenreihe
DOI (zitierfähiger Link)
Internationale Patentnummer
Link zur Lizenz
oops
EU-Projektnummer
Projekt
Open Access-Veröffentlichung
Sammlungen
Titel in einer weiteren Sprache
Publikationstyp
Zeitschriftenartikel
Publikationsstatus
Published
Erschienen in
Physica B: Condensed Matter ; 659 (2023). - 414881. - Elsevier. - ISSN 0921-4526. - eISSN 1873-2135
Zusammenfassung
The deposition potential affects the structural, morphological, optical, and electrochemical impedance spectroscopy properties of cuprous oxide (Cu2O) thin films formed on copper (Cu) substrates adopting a three-electrode electrochemical deposition procedure. XRD data revealed that the deposited films have a cubic structure established with desired (111) growth orientation. Scanning electron microscopy (SEM) images reveal that Cu2O film has very well three-sided pyramid-shaped grains which are equally spread over the surface of the Cu substrates and change substantially when the plating potential is changed. The photo-current density of prepared Cu2O thin films was increased from −1.41 × 10−4 to −3.01 × 10−4 A/cm2 with increasing the deposition potential of −0.3 to −0.6 V, respectively. Further, Cu2O thin films obtained at −0.6 V have the minimum charge transfer resistance (Rct) than Cu2O thin films synthesized at −0.3 to −0.5 V, suggesting that Cu2O thin films produced at −0.6 V have the highest electron transfer efficiency.
Zusammenfassung in einer weiteren Sprache
Fachgebiet (DDC)
530 Physik
Schlagwörter
Konferenz
Rezension
undefined / . - undefined, undefined. - (undefined; undefined)
Zitieren
ISO 690
ALI, Nazakat, Sajad HUSSAIN, Muhammad WAQAS, M. FAHEEM, Naveed AHMAD, Adnan ALI, Muhammad Yasir ALI, Khalid MAHMOOD, Lukas SCHMIDT-MENDE, 2023. Charge transfer in copper oxide thin films deposited at different electrodeposition potential. In: Physica B: Condensed Matter. Elsevier. 659, 414881. ISSN 0921-4526. eISSN 1873-2135. Available under: doi: 10.1016/j.physb.2023.414881BibTex
@article{Ali2023Charg-66800, year={2023}, doi={10.1016/j.physb.2023.414881}, title={Charge transfer in copper oxide thin films deposited at different electrodeposition potential}, volume={659}, issn={0921-4526}, journal={Physica B: Condensed Matter}, author={Ali, Nazakat and Hussain, Sajad and Waqas, Muhammad and Faheem, M. and Ahmad, Naveed and Ali, Adnan and Ali, Muhammad Yasir and Mahmood, Khalid and Schmidt-Mende, Lukas}, note={Article Number: 414881} }
RDF
<rdf:RDF xmlns:dcterms="http://purl.org/dc/terms/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#" xmlns:foaf="http://xmlns.com/foaf/0.1/" xmlns:void="http://rdfs.org/ns/void#" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/66800"> <dc:contributor>Ali, Adnan</dc:contributor> <dcterms:title>Charge transfer in copper oxide thin films deposited at different electrodeposition potential</dcterms:title> <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/> <dcterms:abstract>The deposition potential affects the structural, morphological, optical, and electrochemical impedance spectroscopy properties of cuprous oxide (Cu<sub>2</sub>O) thin films formed on copper (Cu) substrates adopting a three-electrode electrochemical deposition procedure. XRD data revealed that the deposited films have a cubic structure established with desired (111) growth orientation. Scanning electron microscopy (SEM) images reveal that Cu<sub>2</sub>O film has very well three-sided pyramid-shaped grains which are equally spread over the surface of the Cu substrates and change substantially when the plating potential is changed. The photo-current density of prepared Cu<sub>2</sub>O thin films was increased from −1.41 × 10<sup>−4</sup> to −3.01 × 10<sup>−4</sup> A/cm<sup>2</sup> with increasing the deposition potential of −0.3 to −0.6 V, respectively. Further, Cu<sub>2</sub>O thin films obtained at −0.6 V have the minimum charge transfer resistance (R<sub>ct</sub>) than Cu<sub>2</sub>O thin films synthesized at −0.3 to −0.5 V, suggesting that Cu<sub>2</sub>O thin films produced at −0.6 V have the highest electron transfer efficiency.</dcterms:abstract> <dc:creator>Ali, Nazakat</dc:creator> <dc:creator>Ali, Adnan</dc:creator> <dc:creator>Ali, Muhammad Yasir</dc:creator> <dc:contributor>Schmidt-Mende, Lukas</dc:contributor> <dc:creator>Mahmood, Khalid</dc:creator> <dc:contributor>Mahmood, Khalid</dc:contributor> <dc:creator>Faheem, M.</dc:creator> <dc:contributor>Ali, Muhammad Yasir</dc:contributor> <dc:contributor>Faheem, M.</dc:contributor> <dc:language>eng</dc:language> <dcterms:issued>2023</dcterms:issued> <dc:creator>Ahmad, Naveed</dc:creator> <dc:contributor>Ahmad, Naveed</dc:contributor> <dc:contributor>Ali, Nazakat</dc:contributor> <bibo:uri rdf:resource="https://kops.uni-konstanz.de/handle/123456789/66800"/> <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/> <foaf:homepage rdf:resource="http://localhost:8080/"/> <dc:creator>Hussain, Sajad</dc:creator> <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/> <dc:contributor>Hussain, Sajad</dc:contributor> <dc:creator>Schmidt-Mende, Lukas</dc:creator> <dc:creator>Waqas, Muhammad</dc:creator> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2023-05-05T12:52:08Z</dcterms:available> <dc:contributor>Waqas, Muhammad</dc:contributor> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2023-05-05T12:52:08Z</dc:date> </rdf:Description> </rdf:RDF>
Interner Vermerk
xmlui.Submission.submit.DescribeStep.inputForms.label.kops_note_fromSubmitter
Prüfungsdatum der Dissertation
Finanzierungsart
Kommentar zur Publikation
Allianzlizenz
Corresponding Authors der Uni Konstanz vorhanden
Internationale Co-Autor:innen
Universitätsbibliographie
Begutachtet
Unbekannt