POCl3 diffusion with in-situ SiO2 barrier for selective emitter multicrystalline solar grade silicon solar cells

Thumbnail Image
Files
Urrejola_POCl3.pdf(728.43 KB)
Date
2009
Authors
Kristian, Peter
Soiland, Anne-Karin
Enebakk, Erik
Editors
Contact
Journal ISSN
Electronic ISSN
ISBN
Bibliographical data
Publisher
Series
URI (citable link)
urn:nbn:de:bsz:352-194430
DOI (citable link)
10.4229/24thEUPVSEC2009-2CV.5.35
ArXiv-ID
International patent number
Link to the license
In Copyright
EU project number
Project
Open Access publication
Collections
Physik
Chemie
Restricted until
Title in another language
Research Projects
Organizational Units
Journal Issue
Publication type
Contribution to a conference collection
Publication status
Published in
The compiled state-of-the-art of PV solar technology and deployment : 24th European Photovoltaic Solar Energy Conference and Exhibition / Sinke, W. et al. (ed.). - Munich, Germany : WIP-Renewable Energies, 2009. - pp. 1835-1838. - ISBN 3-936338-25-6
Abstract
We present an innovative process for the formation of a selective emitter by using an advanced phosphorous glass as a barrier layer against subsequent diffusion. The advanced barrier glass was achieved by the formation of a standard phosphorous glass treated with additional thermal oxidation immediately after deposition in the same process tube. The resistant layer is used as a barrier for the second diffusion after selective opening of the finger contact areas by screen printing of a SiO2 etching paste. The process was applied for multicrystalline Elkem Solar SoG-Si wafers as well as for references from standard EG-Si. The achieved cell parameters were compared with cell results from a homogenous emitter process. While the efficiency was not enhanced so far due to the relatively high shadow loss of the selective emitter solar cells, the open collector voltage could be increased by up to 9 mV and the short wavelength spectral response increased slightly with this selective emitter. The aim of this work was to combine the SiO2 barrier with the shallow POCl3 diffusion in one process step and the optimization of the screen
printing process for selective emitter solar cells.
Summary in another language
Subject (DDC)
530 Physics
Keywords
solar cells,selective emitter,oxide barrier,fiducial alignment
Conference
24th European Photovoltaic Solar Energy Conference, Sep 21, 2009 - Sep 25, 2009, Hamburg
Review
undefined / . - undefined, undefined. - (undefined; undefined)
Cite This
ISO 690URREJOLA, Elias, Peter KRISTIAN, Anne-Karin SOILAND, Erik ENEBAKK, 2009. POCl3 diffusion with in-situ SiO2 barrier for selective emitter multicrystalline solar grade silicon solar cells. 24th European Photovoltaic Solar Energy Conference. Hamburg, Sep 21, 2009 - Sep 25, 2009. In: SINKE, W., ed. and others. The compiled state-of-the-art of PV solar technology and deployment : 24th European Photovoltaic Solar Energy Conference and Exhibition. Munich, Germany:WIP-Renewable Energies, pp. 1835-1838. ISBN 3-936338-25-6. Available under: doi: 10.4229/24thEUPVSEC2009-2CV.5.35
BibTex
@inproceedings{Urrejola2009diffu-19443,
  year={2009},
  doi={10.4229/24thEUPVSEC2009-2CV.5.35},
  title={POCl<sub>3</sub> diffusion with in-situ SiO<sub>2</sub> barrier for selective emitter multicrystalline solar grade silicon solar cells},
  isbn={3-936338-25-6},
  publisher={WIP-Renewable Energies},
  address={Munich, Germany},
  booktitle={The compiled state-of-the-art of PV solar technology and deployment : 24th European Photovoltaic Solar Energy Conference and Exhibition},
  pages={1835--1838},
  editor={Sinke, W.},
  author={Urrejola, Elias and Kristian, Peter and Soiland, Anne-Karin and Enebakk, Erik}
}
RDF
<rdf:RDF
    xmlns:dcterms="http://purl.org/dc/terms/"
    xmlns:dc="http://purl.org/dc/elements/1.1/"
    xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
    xmlns:bibo="http://purl.org/ontology/bibo/"
    xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
    xmlns:foaf="http://xmlns.com/foaf/0.1/"
    xmlns:void="http://rdfs.org/ns/void#"
    xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > 
  <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/19443">
    <dc:creator>Kristian, Peter</dc:creator>
    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2012-06-13T07:20:32Z</dc:date>
    <dc:contributor>Enebakk, Erik</dc:contributor>
    <dc:contributor>Urrejola, Elias</dc:contributor>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/29"/>
    <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2012-06-13T07:20:32Z</dcterms:available>
    <dc:language>eng</dc:language>
    <dc:contributor>Soiland, Anne-Karin</dc:contributor>
    <dc:creator>Soiland, Anne-Karin</dc:creator>
    <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/19443/1/Urrejola_POCl3.pdf"/>
    <dc:creator>Urrejola, Elias</dc:creator>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dcterms:bibliographicCitation>First publ. in: The compiled state-of-the-art of PV solar technology and deployment : 24th European Photovoltaic Solar Energy Conference and Exhibition ; conference 21 - 25 September 2009, exhibition 21 - 24 September 2009, Hamburg ; proceedings ; EU PVSEC / ed. by: W. Sinke ... - Munich : WIP-Renewable Energies, 2009. - pp. 1835-1838. - ISBN 3-936338-25-6</dcterms:bibliographicCitation>
    <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/19443/1/Urrejola_POCl3.pdf"/>
    <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/19443"/>
    <dc:creator>Enebakk, Erik</dc:creator>
    <dcterms:issued>2009</dcterms:issued>
    <dcterms:title>POCl&lt;sub&gt;3&lt;/sub&gt; diffusion with in-situ SiO&lt;sub&gt;2&lt;/sub&gt; barrier for selective emitter multicrystalline solar grade silicon solar cells</dcterms:title>
    <dc:rights>terms-of-use</dc:rights>
    <foaf:homepage rdf:resource="http://localhost:8080/"/>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/29"/>
    <dc:contributor>Kristian, Peter</dc:contributor>
    <dcterms:abstract xml:lang="eng">We present an innovative process for the formation of a selective emitter by using an advanced phosphorous glass as a barrier layer against subsequent diffusion. The advanced barrier glass was achieved by the formation of a standard phosphorous glass treated with additional thermal oxidation immediately after deposition in the same process tube. The resistant layer is used as a barrier for the second diffusion after selective opening of the finger contact areas by screen printing of a SiO2 etching paste. The process was applied for multicrystalline Elkem Solar SoG-Si wafers as well as for references from standard EG-Si. The achieved cell parameters were compared with cell results from a homogenous emitter process. While the efficiency was not enhanced so far due to the relatively high shadow loss of the selective emitter solar cells, the open collector voltage could be increased by up to 9 mV and the short wavelength spectral response increased slightly with this selective emitter. The aim of this work was to combine the SiO2 barrier with the shallow POCl3 diffusion in one process step and the optimization of the screen&lt;br /&gt;printing process for selective emitter solar cells.</dcterms:abstract>
    <dcterms:rights rdf:resource="https://rightsstatements.org/page/InC/1.0/"/>
  </rdf:Description>
</rdf:RDF>
Internal note
xmlui.Submission.submit.DescribeStep.inputForms.label.kops_note_fromSubmitter
Contact
URL of original publication
Test date of URL
Examination date of dissertation
Method of financing
Comment on publication
Alliance license
Corresponding Authors der Uni Konstanz vorhanden
International Co-Authors
Bibliography of Konstanz
Refereed