Publikation:

POCl3 diffusion with in-situ SiO2 barrier for selective emitter multicrystalline solar grade silicon solar cells

Lade...
Vorschaubild

Dateien

Urrejola_POCl3.pdf
Urrejola_POCl3.pdfGröße: 728.43 KBDownloads: 234

Datum

2009

Autor:innen

Kristian, Peter
Soiland, Anne-Karin
Enebakk, Erik

Herausgeber:innen

Kontakt

ISSN der Zeitschrift

Electronic ISSN

ISBN

Bibliografische Daten

Verlag

Schriftenreihe

Auflagebezeichnung

ArXiv-ID

Internationale Patentnummer

Angaben zur Forschungsförderung

Projekt

Open Access-Veröffentlichung
Open Access Green
Core Facility der Universität Konstanz

Gesperrt bis

Titel in einer weiteren Sprache

Publikationstyp
Beitrag zu einem Konferenzband
Publikationsstatus
Published

Erschienen in

SINKE, W., ed. and others. The compiled state-of-the-art of PV solar technology and deployment : 24th European Photovoltaic Solar Energy Conference and Exhibition. Munich, Germany: WIP-Renewable Energies, 2009, pp. 1835-1838. ISBN 3-936338-25-6. Available under: doi: 10.4229/24thEUPVSEC2009-2CV.5.35

Zusammenfassung

We present an innovative process for the formation of a selective emitter by using an advanced phosphorous glass as a barrier layer against subsequent diffusion. The advanced barrier glass was achieved by the formation of a standard phosphorous glass treated with additional thermal oxidation immediately after deposition in the same process tube. The resistant layer is used as a barrier for the second diffusion after selective opening of the finger contact areas by screen printing of a SiO2 etching paste. The process was applied for multicrystalline Elkem Solar SoG-Si wafers as well as for references from standard EG-Si. The achieved cell parameters were compared with cell results from a homogenous emitter process. While the efficiency was not enhanced so far due to the relatively high shadow loss of the selective emitter solar cells, the open collector voltage could be increased by up to 9 mV and the short wavelength spectral response increased slightly with this selective emitter. The aim of this work was to combine the SiO2 barrier with the shallow POCl3 diffusion in one process step and the optimization of the screen
printing process for selective emitter solar cells.

Zusammenfassung in einer weiteren Sprache

Fachgebiet (DDC)
530 Physik

Schlagwörter

solar cells, selective emitter, oxide barrier, fiducial alignment

Konferenz

24th European Photovoltaic Solar Energy Conference, 21. Sept. 2009 - 25. Sept. 2009, Hamburg
Rezension
undefined / . - undefined, undefined

Forschungsvorhaben

Organisationseinheiten

Zeitschriftenheft

Zugehörige Datensätze in KOPS

Zitieren

ISO 690URREJOLA, Elias, Peter KRISTIAN, Anne-Karin SOILAND, Erik ENEBAKK, 2009. POCl3 diffusion with in-situ SiO2 barrier for selective emitter multicrystalline solar grade silicon solar cells. 24th European Photovoltaic Solar Energy Conference. Hamburg, 21. Sept. 2009 - 25. Sept. 2009. In: SINKE, W., ed. and others. The compiled state-of-the-art of PV solar technology and deployment : 24th European Photovoltaic Solar Energy Conference and Exhibition. Munich, Germany: WIP-Renewable Energies, 2009, pp. 1835-1838. ISBN 3-936338-25-6. Available under: doi: 10.4229/24thEUPVSEC2009-2CV.5.35
BibTex
@inproceedings{Urrejola2009diffu-19443,
  year={2009},
  doi={10.4229/24thEUPVSEC2009-2CV.5.35},
  title={POCl<sub>3</sub> diffusion with in-situ SiO<sub>2</sub> barrier for selective emitter multicrystalline solar grade silicon solar cells},
  isbn={3-936338-25-6},
  publisher={WIP-Renewable Energies},
  address={Munich, Germany},
  booktitle={The compiled state-of-the-art of PV solar technology and deployment : 24th European Photovoltaic Solar Energy Conference and Exhibition},
  pages={1835--1838},
  editor={Sinke, W.},
  author={Urrejola, Elias and Kristian, Peter and Soiland, Anne-Karin and Enebakk, Erik}
}
RDF
<rdf:RDF
    xmlns:dcterms="http://purl.org/dc/terms/"
    xmlns:dc="http://purl.org/dc/elements/1.1/"
    xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
    xmlns:bibo="http://purl.org/ontology/bibo/"
    xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
    xmlns:foaf="http://xmlns.com/foaf/0.1/"
    xmlns:void="http://rdfs.org/ns/void#"
    xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > 
  <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/19443">
    <dc:creator>Kristian, Peter</dc:creator>
    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2012-06-13T07:20:32Z</dc:date>
    <dc:contributor>Enebakk, Erik</dc:contributor>
    <dc:contributor>Urrejola, Elias</dc:contributor>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/29"/>
    <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2012-06-13T07:20:32Z</dcterms:available>
    <dc:language>eng</dc:language>
    <dc:contributor>Soiland, Anne-Karin</dc:contributor>
    <dc:creator>Soiland, Anne-Karin</dc:creator>
    <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/19443/1/Urrejola_POCl3.pdf"/>
    <dc:creator>Urrejola, Elias</dc:creator>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dcterms:bibliographicCitation>First publ. in: The compiled state-of-the-art of PV solar technology and deployment : 24th European Photovoltaic Solar Energy Conference and Exhibition ; conference 21 - 25 September 2009, exhibition 21 - 24 September 2009, Hamburg ; proceedings ; EU PVSEC / ed. by: W. Sinke ... - Munich : WIP-Renewable Energies, 2009. - pp. 1835-1838. - ISBN 3-936338-25-6</dcterms:bibliographicCitation>
    <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/19443/1/Urrejola_POCl3.pdf"/>
    <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/19443"/>
    <dc:creator>Enebakk, Erik</dc:creator>
    <dcterms:issued>2009</dcterms:issued>
    <dcterms:title>POCl&lt;sub&gt;3&lt;/sub&gt; diffusion with in-situ SiO&lt;sub&gt;2&lt;/sub&gt; barrier for selective emitter multicrystalline solar grade silicon solar cells</dcterms:title>
    <dc:rights>terms-of-use</dc:rights>
    <foaf:homepage rdf:resource="http://localhost:8080/"/>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/29"/>
    <dc:contributor>Kristian, Peter</dc:contributor>
    <dcterms:abstract xml:lang="eng">We present an innovative process for the formation of a selective emitter by using an advanced phosphorous glass as a barrier layer against subsequent diffusion. The advanced barrier glass was achieved by the formation of a standard phosphorous glass treated with additional thermal oxidation immediately after deposition in the same process tube. The resistant layer is used as a barrier for the second diffusion after selective opening of the finger contact areas by screen printing of a SiO2 etching paste. The process was applied for multicrystalline Elkem Solar SoG-Si wafers as well as for references from standard EG-Si. The achieved cell parameters were compared with cell results from a homogenous emitter process. While the efficiency was not enhanced so far due to the relatively high shadow loss of the selective emitter solar cells, the open collector voltage could be increased by up to 9 mV and the short wavelength spectral response increased slightly with this selective emitter. The aim of this work was to combine the SiO2 barrier with the shallow POCl3 diffusion in one process step and the optimization of the screen&lt;br /&gt;printing process for selective emitter solar cells.</dcterms:abstract>
    <dcterms:rights rdf:resource="https://rightsstatements.org/page/InC/1.0/"/>
  </rdf:Description>
</rdf:RDF>

Interner Vermerk

xmlui.Submission.submit.DescribeStep.inputForms.label.kops_note_fromSubmitter

Kontakt
URL der Originalveröffentl.

Prüfdatum der URL

Prüfungsdatum der Dissertation

Finanzierungsart

Kommentar zur Publikation

Allianzlizenz
Corresponding Authors der Uni Konstanz vorhanden
Internationale Co-Autor:innen
Universitätsbibliographie
Begutachtet
Diese Publikation teilen