Design and photoinduced surface relief grating formation of photoresponsive azobenzene based molecular materials with ruthenium acetylides

dc.contributor.authorGherab, Kichou N.deu
dc.contributor.authorGatri, Rafikdeu
dc.contributor.authorHank, Zakiadeu
dc.contributor.authorDick, Bernharddeu
dc.contributor.authorKutta, Roger-Jandeu
dc.contributor.authorWinter, Rainer F.
dc.contributor.authorLuc, Jérômedeu
dc.contributor.authorSahraoui, Bouchtadeu
dc.contributor.authorFillaut, Jean-Lucdeu
dc.date.accessioned2011-06-17T07:17:23Zdeu
dc.date.available2011-06-17T07:17:23Zdeu
dc.date.issued2010
dc.description.abstractNovel photoresponsive materials based on ruthenium(II) σ-acetylides coupled to an azobenzene moiety in the main π-conjugated chain have been synthesized. The introduction of a metal acetylide fragment in the same conjugated chain as the azobenzene induces the trans-cis-trans isomerization of the azo unit, while the rate of the thermal cis → trans back isomerization increases with increasing overall electron richness of these compounds. These azobenzene-containing ruthenium(II) acetylides show satisfactory processability and give rise to spin-coated uniform thin films. Formation of surface-relief gratings on their amorphous thin films and in a PMMA polymer matrix using a picosecond pulsed laser at 532 nm results in instantaneous inscription: saturation of the first order diffraction efficiency and of the modulation amplitude of gratings were obtained in less than 1 s, while the orientation of these azodyes remains unchanged for up to 6 months.eng
dc.description.versionpublished
dc.identifier.citationFirst publ. in: Journal of Materials Chemistry 20 (2010), 14, pp. 2858-2864deu
dc.identifier.doi10.1039/B921450Jdeu
dc.identifier.ppn346094186deu
dc.identifier.urihttp://kops.uni-konstanz.de/handle/123456789/13594
dc.language.isoengdeu
dc.legacy.dateIssued2011-06-17deu
dc.rightsterms-of-usedeu
dc.rights.urihttps://rightsstatements.org/page/InC/1.0/deu
dc.subject.ddc540deu
dc.titleDesign and photoinduced surface relief grating formation of photoresponsive azobenzene based molecular materials with ruthenium acetylideseng
dc.typeJOURNAL_ARTICLEdeu
dspace.entity.typePublication
kops.citation.bibtex
@article{Gherab2010Desig-13594,
  year={2010},
  doi={10.1039/B921450J},
  title={Design and photoinduced surface relief grating formation of photoresponsive azobenzene based molecular materials with ruthenium acetylides},
  number={14},
  volume={20},
  issn={0959-9428},
  journal={Journal of Materials Chemistry},
  pages={2858--2864},
  author={Gherab, Kichou N. and Gatri, Rafik and Hank, Zakia and Dick, Bernhard and Kutta, Roger-Jan and Winter, Rainer F. and Luc, Jérôme and Sahraoui, Bouchta and Fillaut, Jean-Luc}
}
kops.citation.iso690GHERAB, Kichou N., Rafik GATRI, Zakia HANK, Bernhard DICK, Roger-Jan KUTTA, Rainer F. WINTER, Jérôme LUC, Bouchta SAHRAOUI, Jean-Luc FILLAUT, 2010. Design and photoinduced surface relief grating formation of photoresponsive azobenzene based molecular materials with ruthenium acetylides. In: Journal of Materials Chemistry. 2010, 20(14), pp. 2858-2864. ISSN 0959-9428. Available under: doi: 10.1039/B921450Jdeu
kops.citation.iso690GHERAB, Kichou N., Rafik GATRI, Zakia HANK, Bernhard DICK, Roger-Jan KUTTA, Rainer F. WINTER, Jérôme LUC, Bouchta SAHRAOUI, Jean-Luc FILLAUT, 2010. Design and photoinduced surface relief grating formation of photoresponsive azobenzene based molecular materials with ruthenium acetylides. In: Journal of Materials Chemistry. 2010, 20(14), pp. 2858-2864. ISSN 0959-9428. Available under: doi: 10.1039/B921450Jeng
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kops.sourcefieldJournal of Materials Chemistry. 2010, <b>20</b>(14), pp. 2858-2864. ISSN 0959-9428. Available under: doi: 10.1039/B921450Jdeu
kops.sourcefield.plainJournal of Materials Chemistry. 2010, 20(14), pp. 2858-2864. ISSN 0959-9428. Available under: doi: 10.1039/B921450Jdeu
kops.sourcefield.plainJournal of Materials Chemistry. 2010, 20(14), pp. 2858-2864. ISSN 0959-9428. Available under: doi: 10.1039/B921450Jeng
kops.submitter.emailoleg.kozlov@uni-konstanz.dedeu
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