Robust Two-Dimensional Electronic Properties in Three-Dimensional Microstructures of Rotationally Stacked Turbostratic Graphene

dc.contributor.authorRichter, Nils
dc.contributor.authorHernandez, Yenny R.
dc.contributor.authorSchweitzer, Sebastian
dc.contributor.authorKim, June Seo
dc.contributor.authorPatra, Ajit Kumar
dc.contributor.authorEnglert, Jan
dc.contributor.authorLieberwirth, Ingo
dc.contributor.authorLiscio, Andrea
dc.contributor.authorPalermo, Vincenzo
dc.contributor.authorKläui, Mathias
dc.date.accessioned2017-05-11T10:17:34Z
dc.date.available2017-05-11T10:17:34Z
dc.date.issued2017eng
dc.description.abstractWe report on the electronic properties of turbostratic graphitic microdisks, rotationally stacked systems of graphene layers, where interlayer twisting leads to electronic decoupling resulting in charge-transport properties that retain the two dimensionality of graphene, despite the presence of a large number of layers. A key fingerprint of this reduced dimensionality is the effect of weak charge-carrier localization that we observe at low temperatures. The disks’ resistivity measured as a function of magnetic field changes its shape from parabolic at room temperature to linear at a temperature of 2.7 K indicating further this type of two-dimensional transport. Compared to Bernal stacked graphite, turbostratic graphene is mechanically much more robust, and it exhibits almost negligible variations of the electrical properties between samples. We demonstrate a reproducible resistivity of (3.52±0.11)×10−6  Ω m, which is a particularly low value for graphitic systems. Combined with large charge-carrier mobilities demonstrated at low temperatures of up to 7×104  cm2/V s, typical for carbon-based crystalline conductors, such disks are highly interesting from a scientific point of view and, in particular, for applications where robust electronic properties are required.eng
dc.description.versionpublishedde
dc.identifier.doi10.1103/PhysRevApplied.7.024022eng
dc.identifier.urihttps://kops.uni-konstanz.de/handle/123456789/38848
dc.language.isoengeng
dc.subject.ddc530eng
dc.titleRobust Two-Dimensional Electronic Properties in Three-Dimensional Microstructures of Rotationally Stacked Turbostratic Grapheneeng
dc.typeJOURNAL_ARTICLEde
dspace.entity.typePublication
kops.citation.bibtex
@article{Richter2017Robus-38848,
  year={2017},
  doi={10.1103/PhysRevApplied.7.024022},
  title={Robust Two-Dimensional Electronic Properties in Three-Dimensional Microstructures of Rotationally Stacked Turbostratic Graphene},
  number={2},
  volume={7},
  journal={Physical Review Applied},
  author={Richter, Nils and Hernandez, Yenny R. and Schweitzer, Sebastian and Kim, June Seo and Patra, Ajit Kumar and Englert, Jan and Lieberwirth, Ingo and Liscio, Andrea and Palermo, Vincenzo and Kläui, Mathias},
  note={Article Number: 024022}
}
kops.citation.iso690RICHTER, Nils, Yenny R. HERNANDEZ, Sebastian SCHWEITZER, June Seo KIM, Ajit Kumar PATRA, Jan ENGLERT, Ingo LIEBERWIRTH, Andrea LISCIO, Vincenzo PALERMO, Mathias KLÄUI, 2017. Robust Two-Dimensional Electronic Properties in Three-Dimensional Microstructures of Rotationally Stacked Turbostratic Graphene. In: Physical Review Applied. 2017, 7(2), 024022. eISSN 2331-7019. Available under: doi: 10.1103/PhysRevApplied.7.024022deu
kops.citation.iso690RICHTER, Nils, Yenny R. HERNANDEZ, Sebastian SCHWEITZER, June Seo KIM, Ajit Kumar PATRA, Jan ENGLERT, Ingo LIEBERWIRTH, Andrea LISCIO, Vincenzo PALERMO, Mathias KLÄUI, 2017. Robust Two-Dimensional Electronic Properties in Three-Dimensional Microstructures of Rotationally Stacked Turbostratic Graphene. In: Physical Review Applied. 2017, 7(2), 024022. eISSN 2331-7019. Available under: doi: 10.1103/PhysRevApplied.7.024022eng
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kops.sourcefieldPhysical Review Applied. 2017, <b>7</b>(2), 024022. eISSN 2331-7019. Available under: doi: 10.1103/PhysRevApplied.7.024022deu
kops.sourcefield.plainPhysical Review Applied. 2017, 7(2), 024022. eISSN 2331-7019. Available under: doi: 10.1103/PhysRevApplied.7.024022deu
kops.sourcefield.plainPhysical Review Applied. 2017, 7(2), 024022. eISSN 2331-7019. Available under: doi: 10.1103/PhysRevApplied.7.024022eng
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source.periodicalTitlePhysical Review Appliedeng

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