Publikation: Electrical, optical and structural investigation of plasma-enhanced chemical-vapour-deposited amorphous silicon oxynitride films for solar cell applications
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2013
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Solar Energy Materials and Solar Cells. 2013, 108, pp. 180-188. ISSN 0927-0248. Available under: doi: 10.1016/j.solmat.2012.09.025
Zusammenfassung
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Fachgebiet (DDC)
530 Physik
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Surface passivation, Amorphous silicon oxynitride, Wide band gap heterojunctions
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BRINKMANN, Nils H., Daniel SOMMER, Gabriel MICARD, Giso HAHN, Barbara TERHEIDEN, 2013. Electrical, optical and structural investigation of plasma-enhanced chemical-vapour-deposited amorphous silicon oxynitride films for solar cell applications. In: Solar Energy Materials and Solar Cells. 2013, 108, pp. 180-188. ISSN 0927-0248. Available under: doi: 10.1016/j.solmat.2012.09.025BibTex
@article{Brinkmann2013Elect-23116, year={2013}, doi={10.1016/j.solmat.2012.09.025}, title={Electrical, optical and structural investigation of plasma-enhanced chemical-vapour-deposited amorphous silicon oxynitride films for solar cell applications}, volume={108}, issn={0927-0248}, journal={Solar Energy Materials and Solar Cells}, pages={180--188}, author={Brinkmann, Nils H. and Sommer, Daniel and Micard, Gabriel and Hahn, Giso and Terheiden, Barbara} }
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