Ultrabroadband Moth-Eye Antireflection Structures on GaSe Produced by Focused-Ion Beam Milling
| dc.contributor.author | Sulzer, Philipp | |
| dc.contributor.author | Hagner, Matthias | |
| dc.contributor.author | Liehl, Andreas | |
| dc.contributor.author | Cimander, Moritz | |
| dc.contributor.author | Kempf, Hannes | |
| dc.contributor.author | Bitzer, Annegret | |
| dc.contributor.author | Herter, Alexa | |
| dc.contributor.author | Leitenstorfer, Alfred | |
| dc.date.accessioned | 2022-02-22T10:03:53Z | |
| dc.date.available | 2022-02-22T10:03:53Z | |
| dc.date.issued | 2021 | eng |
| dc.description.abstract | Minimizing losses and suppression of reflection-induced echos in thin nonlinear crystals is of critical importance to both classical time-domain spectroscopy and time-domain quantum electrodynamics [1] . GaSe represents an important material in this context. However, it is challenging to coat and manipulate using macroscopic methods due to its van-der-Waals-bonded structure of hexagonal monolayers and atomically flat surfaces. At least, some progress relying on femtosecond laser ablation was demonstrated recently [2] . | eng |
| dc.description.version | published | de |
| dc.identifier.doi | 10.1109/CLEO/Europe-EQEC52157.2021.9592639 | eng |
| dc.identifier.uri | https://kops.uni-konstanz.de/handle/123456789/56636 | |
| dc.language.iso | eng | eng |
| dc.subject.ddc | 530 | eng |
| dc.title | Ultrabroadband Moth-Eye Antireflection Structures on GaSe Produced by Focused-Ion Beam Milling | eng |
| dc.type | INPROCEEDINGS | de |
| dspace.entity.type | Publication | |
| kops.citation.bibtex | @inproceedings{Sulzer2021Ultra-56636,
year={2021},
doi={10.1109/CLEO/Europe-EQEC52157.2021.9592639},
title={Ultrabroadband Moth-Eye Antireflection Structures on GaSe Produced by Focused-Ion Beam Milling},
isbn={978-1-66541-876-8},
publisher={IEEE},
address={Piscataway, NJ},
booktitle={2021 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC)},
author={Sulzer, Philipp and Hagner, Matthias and Liehl, Andreas and Cimander, Moritz and Kempf, Hannes and Bitzer, Annegret and Herter, Alexa and Leitenstorfer, Alfred}
} | |
| kops.citation.iso690 | SULZER, Philipp, Matthias HAGNER, Andreas LIEHL, Moritz CIMANDER, Hannes KEMPF, Annegret BITZER, Alexa HERTER, Alfred LEITENSTORFER, 2021. Ultrabroadband Moth-Eye Antireflection Structures on GaSe Produced by Focused-Ion Beam Milling. 2021 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC). Munich, Germany, 21. Juni 2021 - 25. Juni 2021. In: 2021 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC). Piscataway, NJ: IEEE, 2021. ISBN 978-1-66541-876-8. Available under: doi: 10.1109/CLEO/Europe-EQEC52157.2021.9592639 | deu |
| kops.citation.iso690 | SULZER, Philipp, Matthias HAGNER, Andreas LIEHL, Moritz CIMANDER, Hannes KEMPF, Annegret BITZER, Alexa HERTER, Alfred LEITENSTORFER, 2021. Ultrabroadband Moth-Eye Antireflection Structures on GaSe Produced by Focused-Ion Beam Milling. 2021 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC). Munich, Germany, Jun 21, 2021 - Jun 25, 2021. In: 2021 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC). Piscataway, NJ: IEEE, 2021. ISBN 978-1-66541-876-8. Available under: doi: 10.1109/CLEO/Europe-EQEC52157.2021.9592639 | eng |
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| source.title | 2021 Conference on Lasers and Electro-Optics Europe & European Quantum Electronics Conference (CLEO/Europe-EQEC) | eng |