Surface acceleration during dry laser cleaning of silicon

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dc.contributor.authorDobler, Volkerdeu
dc.contributor.authorOltra, Rolanddeu
dc.contributor.authorBoquillon, Jean-Pierredeu
dc.contributor.authorMosbacher, Mario
dc.contributor.authorBoneberg, Johannes
dc.contributor.authorLeiderer, Paul
dc.date.accessioned2011-03-24T17:57:12Zdeu
dc.date.available2011-03-24T17:57:12Zdeu
dc.date.issued1999deu
dc.description.abstractWe report on measurements of the surface acceleration for the application of dry laser cleaning. For that purpose, industrial silicon samples were irradiated by a frequency-doubled Q-switched Nd:YAG laser. The surface displacement was measured by a heterodyne interferometer and recorded by a digital storage oscilloscope. Several hundreds of shots were averaged to give smooth displacement curves which could be derived numerically. The experiments show that the highest accelerations, which are thought to be responsible for the cleaning, occur on the time scale of the laser pulse. Simple theoretical models are in good agreement with the experimental data. The maximal displacement depends only on the deposited energy, while the maximal acceleration shows also a strong dependence from the temporal pulse shape. This knowledge allows one to optimize the pulse shape for the cleaning process.eng
dc.description.versionpublished
dc.format.mimetypeapplication/pdfdeu
dc.identifier.citationFirst publ. in: Applied Physics A 69 (1999), pp. 335-337deu
dc.identifier.doi10.1007/s003390051412
dc.identifier.ppn265071828deu
dc.identifier.urihttp://kops.uni-konstanz.de/handle/123456789/9466
dc.language.isoengdeu
dc.legacy.dateIssued2007deu
dc.rightsAttribution-NonCommercial-NoDerivs 2.0 Generic
dc.rights.urihttp://creativecommons.org/licenses/by-nc-nd/2.0/
dc.subject.ddc530deu
dc.titleSurface acceleration during dry laser cleaning of siliconeng
dc.typeJOURNAL_ARTICLEdeu
dspace.entity.typePublication
kops.citation.bibtex
@article{Dobler1999Surfa-9466,
  year={1999},
  doi={10.1007/s003390051412},
  title={Surface acceleration during dry laser cleaning of silicon},
  volume={69},
  journal={Applied Physics A},
  pages={335--337},
  author={Dobler, Volker and Oltra, Roland and Boquillon, Jean-Pierre and Mosbacher, Mario and Boneberg, Johannes and Leiderer, Paul}
}
kops.citation.iso690DOBLER, Volker, Roland OLTRA, Jean-Pierre BOQUILLON, Mario MOSBACHER, Johannes BONEBERG, Paul LEIDERER, 1999. Surface acceleration during dry laser cleaning of silicon. In: Applied Physics A. 1999, 69, pp. 335-337. Available under: doi: 10.1007/s003390051412deu
kops.citation.iso690DOBLER, Volker, Roland OLTRA, Jean-Pierre BOQUILLON, Mario MOSBACHER, Johannes BONEBERG, Paul LEIDERER, 1999. Surface acceleration during dry laser cleaning of silicon. In: Applied Physics A. 1999, 69, pp. 335-337. Available under: doi: 10.1007/s003390051412eng
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kops.sourcefieldApplied Physics A. 1999, <b>69</b>, pp. 335-337. Available under: doi: 10.1007/s003390051412deu
kops.sourcefield.plainApplied Physics A. 1999, 69, pp. 335-337. Available under: doi: 10.1007/s003390051412deu
kops.sourcefield.plainApplied Physics A. 1999, 69, pp. 335-337. Available under: doi: 10.1007/s003390051412eng
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