Magnetoresistance measurement of tailored Permalloy nanocontacts

Kurzanzeige
dc.contributor.authorPatra, Ajitdeu
dc.contributor.authorBieren, Arndt vondeu
dc.contributor.authorKrzyk, Stephen
dc.contributor.authorRhensius, Jandeu
dc.contributor.authorHeyderman, Lauradeu
dc.contributor.authorHoffmann, Reginadeu
dc.contributor.authorKläui, Mathias
dc.date.accessioned2012-07-24T08:10:36Zdeu
dc.date.available2012-07-24T08:10:36Zdeu
dc.date.issued2010
dc.description.abstractWe study the evolution of the magnetoresistance (MR) in Permalloy nanocontacts prepared by controlled low-temperature UHV electromigration in nanoring segment structures with constrictions. The ring geometry allows for the controlled and reproducible positioning of a domain wall in the nanocontacts. We observe three different resistance levels, corresponding to distinct domain-wall positions. A change in the sign of the MR difference, between a domain wall at the constriction and a domain wall next to the constriction, occurs with decreasing constriction width. This is in line with our micromagnetic simulations, where the MR is calculated based on the anisotropic MR (AMR) effect.eng
dc.description.versionpublished
dc.identifier.citationFirst publ. in: Physical Review B ; 82 (2010), 13. - 134447deu
dc.identifier.doi10.1103/PhysRevB.82.134447deu
dc.identifier.ppn368554457deu
dc.identifier.urihttp://kops.uni-konstanz.de/handle/123456789/19844
dc.language.isoengdeu
dc.legacy.dateIssued2012-07-24deu
dc.rightsterms-of-usedeu
dc.rights.urihttps://rightsstatements.org/page/InC/1.0/deu
dc.subject.ddc530deu
dc.subject.pacs75.47.-m, 72.25.Ba, 73.63.Rt, 75.75.-cdeu
dc.titleMagnetoresistance measurement of tailored Permalloy nanocontactseng
dc.typeJOURNAL_ARTICLEdeu
dspace.entity.typePublication
kops.citation.bibtex
@article{Patra2010Magne-19844,
  year={2010},
  doi={10.1103/PhysRevB.82.134447},
  title={Magnetoresistance measurement of tailored Permalloy nanocontacts},
  number={13},
  volume={82},
  issn={1098-0121},
  journal={Physical Review B},
  author={Patra, Ajit and Bieren, Arndt von and Krzyk, Stephen and Rhensius, Jan and Heyderman, Laura and Hoffmann, Regina and Kläui, Mathias}
}
kops.citation.iso690PATRA, Ajit, Arndt von BIEREN, Stephen KRZYK, Jan RHENSIUS, Laura HEYDERMAN, Regina HOFFMANN, Mathias KLÄUI, 2010. Magnetoresistance measurement of tailored Permalloy nanocontacts. In: Physical Review B. 2010, 82(13). ISSN 1098-0121. Available under: doi: 10.1103/PhysRevB.82.134447deu
kops.citation.iso690PATRA, Ajit, Arndt von BIEREN, Stephen KRZYK, Jan RHENSIUS, Laura HEYDERMAN, Regina HOFFMANN, Mathias KLÄUI, 2010. Magnetoresistance measurement of tailored Permalloy nanocontacts. In: Physical Review B. 2010, 82(13). ISSN 1098-0121. Available under: doi: 10.1103/PhysRevB.82.134447eng
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kops.sourcefieldPhysical Review B. 2010, <b>82</b>(13). ISSN 1098-0121. Available under: doi: 10.1103/PhysRevB.82.134447deu
kops.sourcefield.plainPhysical Review B. 2010, 82(13). ISSN 1098-0121. Available under: doi: 10.1103/PhysRevB.82.134447deu
kops.sourcefield.plainPhysical Review B. 2010, 82(13). ISSN 1098-0121. Available under: doi: 10.1103/PhysRevB.82.134447eng
kops.submitter.emailregina.fleischmann@uni-konstanz.dedeu
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source.periodicalTitlePhysical Review B

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