Deposition von Si4 auf Oberflächen

Cite This

Files in this item

Checksum: MD5:1774311550bdc2324ce3bf1b8b1e8fdb

GRASS, Martin, 2002. Deposition von Si4 auf Oberflächen [Dissertation]. Konstanz: University of Konstanz

@phdthesis{Grass2002Depos-9493, title={Deposition von Si4 auf Oberflächen}, year={2002}, author={Grass, Martin}, address={Konstanz}, school={Universität Konstanz} }

<rdf:RDF xmlns:dcterms="" xmlns:dc="" xmlns:rdf="" xmlns:bibo="" xmlns:dspace="" xmlns:foaf="" xmlns:void="" xmlns:xsd="" > <rdf:Description rdf:about=""> <dc:format>application/pdf</dc:format> <dcterms:alternative>Deposition of Si4 on surfaces</dcterms:alternative> <dcterms:isPartOf rdf:resource=""/> <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/> <dcterms:issued>2002</dcterms:issued> <dcterms:available rdf:datatype="">2011-03-24T17:57:27Z</dcterms:available> <dc:creator>Grass, Martin</dc:creator> <dc:language>deu</dc:language> <dc:rights>terms-of-use</dc:rights> <bibo:uri rdf:resource=""/> <dcterms:abstract xml:lang="eng">Stable clusters can be used as building blocks for new cluster materials. For an example take the fullerit that consists of C60 clusters. Such materials have potentially very interesting properties. In the current work Si4 has been investigated for its properties, especially whether it is suited as a building block for a new cluster based material. Therefore Si4 has been produced in a cluster ion source and soft landed on different surfaces. With a scanning tunneling microscope (STM) it has been shown that the major part of the clusters is mobile on the surface. Some clusters are pinned to surface defects and act as nucleation centres for larger agglomerates. With x-ray photoelectron spectroscopy (XPS) first evidence was found that the Si4 clusters on the surface are very stable against chemical reactions and fusion. For comparison deposited silicon atoms in contrast show a very different behaviour. UV photoelectron measurements (UPS) show evidence that points into the same direction. To confirm these assumptions improvements to the UPS experiment and theoretical studies are suggested.</dcterms:abstract> <foaf:homepage rdf:resource="http://localhost:8080/jspui"/> <dcterms:title>Deposition von Si4 auf Oberflächen</dcterms:title> <dcterms:hasPart rdf:resource=""/> <dspace:hasBitstream rdf:resource=""/> <dc:contributor>Grass, Martin</dc:contributor> <dspace:isPartOfCollection rdf:resource=""/> <dcterms:rights rdf:resource=""/> <dc:date rdf:datatype="">2011-03-24T17:57:27Z</dc:date> </rdf:Description> </rdf:RDF>

Downloads since Oct 1, 2014 (Information about access statistics)

martin_doktor.pdf 171

This item appears in the following Collection(s)

Search KOPS


My Account