Wetting behaviour of solid and liquid hydrogen films

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KLIER, Jürgen, Christian WEICHHARD, Paul LEIDERER, 2000. Wetting behaviour of solid and liquid hydrogen films. In: Physica B. 284, pp. 391-392

@article{Klier2000Wetti-9388, title={Wetting behaviour of solid and liquid hydrogen films}, year={2000}, doi={10.1016/S0921-4526(99)02784-2}, volume={284}, journal={Physica B}, pages={391--392}, author={Klier, Jürgen and Weichhard, Christian and Leiderer, Paul} }

<rdf:RDF xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcterms="http://purl.org/dc/terms/" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/rdf/resource/123456789/9388"> <dc:creator>Weichhard, Christian</dc:creator> <dc:creator>Klier, Jürgen</dc:creator> <dc:contributor>Klier, Jürgen</dc:contributor> <dcterms:bibliographicCitation>First publ. in: Physica B 284 (2000), pp. 391-392</dcterms:bibliographicCitation> <dc:language>eng</dc:language> <dcterms:rights rdf:resource="https://creativecommons.org/licenses/by-nc-nd/2.0/legalcode"/> <dc:creator>Leiderer, Paul</dc:creator> <dc:contributor>Leiderer, Paul</dc:contributor> <dcterms:issued>2000</dcterms:issued> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T17:56:05Z</dc:date> <dc:contributor>Weichhard, Christian</dc:contributor> <dc:format>application/pdf</dc:format> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T17:56:05Z</dcterms:available> <dcterms:title>Wetting behaviour of solid and liquid hydrogen films</dcterms:title> <dcterms:abstract xml:lang="eng">Adsorbates on strong bindlng substrates like H2 on Au show triple-point dewetting. To study this phenomenon in detail, we have reduced the van der Waals interaction of the H2 films with the Au surface, by preplating the substrate with Ne, Ar or CH4. From a theoretical model, which considers the deformation of the adsorbate by the attractive van der Waals potential and the lattice mismatch due to different lattice constants of adsorbate and substrate, complete wetting is expected when preplating the substrate. Our experiments show, however, that for all combinations of preplated material the equilibrium H2 film thickness is - apart from small differences - the same as without preplating. This indicates that the present picture of the triple-point wetting of H2 is incomplete.</dcterms:abstract> <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/9388"/> <dc:rights>deposit-license</dc:rights> </rdf:Description> </rdf:RDF>

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