A comparison of ns and ps steam laser cleaning of Si surfaces


Dateien zu dieser Ressource

Prüfsumme: MD5:0ac4d2f0390928b9d94d961cf287e89e

MOSBACHER, Mario, Nouari CHAOUI, Jan Philip SIEGEL, Volker DOBLER, Francisco Javier SOLIS CESPEDES, Johannes BONEBERG, Carmen Nieves AFONSO RODRIGUEZ, Paul LEIDERER, 1999. A comparison of ns and ps steam laser cleaning of Si surfaces. In: Applied Physics / A, Materials Science and Processing. 69(Supplement 1), pp. S331-S334

@article{Mosbacher1999compa-9362, title={A comparison of ns and ps steam laser cleaning of Si surfaces}, year={1999}, doi={10.1007/s003390051411}, number={Supplement 1}, volume={69}, journal={Applied Physics / A, Materials Science and Processing}, pages={S331--S334}, author={Mosbacher, Mario and Chaoui, Nouari and Siegel, Jan Philip and Dobler, Volker and Solis Cespedes, Francisco Javier and Boneberg, Johannes and Afonso Rodriguez, Carmen Nieves and Leiderer, Paul} }

Boneberg, Johannes Afonso Rodriguez, Carmen Nieves Leiderer, Paul Mosbacher, Mario 1999 First publ. in: Applied Physics / A, Materials Science and Processing, 69 (1999), Supplement 1, pp. S331 S334 Boneberg, Johannes Chaoui, Nouari Siegel, Jan Philip deposit-license Afonso Rodriguez, Carmen Nieves application/pdf Dobler, Volker A comparison of ns and ps steam laser cleaning of Si surfaces eng Dobler, Volker 2011-03-24T17:55:51Z Siegel, Jan Philip Leiderer, Paul Mosbacher, Mario 2011-03-24T17:55:51Z Solis Cespedes, Francisco Javier Solis Cespedes, Francisco Javier We report a quantitative investigation on the efficiency of the steam laser cleaning process using ns and ps pulses. Well-characterized polymer particles with a diameter of 800 nm dispersed on commercial Si wafers were chosen as a modeling contaminant system. As a result of our investigation, we show for the first time the feasibility of performing efficient steam laser cleaning with ps laser pulses and compare the achieved efficiency with the one obtained for ns pulses. For ns pulses, we found a cleaning fluence threshold of 50 mJ/cm2 that is independent of the pulse durations (2.5 ns and 8 ns) and the wavelengths (532 nm and 583 nm) used. The application of ps pulses (FWHM=30 ps, h=583 nm) lowered this threshold to 20 mJ/cm2. Both cleaning thresholds are far below the melting thresholds for these laser parameters. Cleaning efficiencies > 90% were reached for both pulse durations. Chaoui, Nouari

Dateiabrufe seit 01.10.2014 (Informationen über die Zugriffsstatistik)

250_applph_1999.pdf 85

Das Dokument erscheint in:

deposit-license Solange nicht anders angezeigt, wird die Lizenz wie folgt beschrieben: deposit-license

KOPS Suche


Mein Benutzerkonto