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Thermal stability of PECVD a-Si1-xCx layers for crystalline silicon solar cell passivation

Thermal stability of PECVD a-Si1-xCx layers for crystalline silicon solar cell passivation

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RIEGEL, Stefanie, Bernd RAABE, Michael P. STEWART, Hemant MUNGEKAR, Peter BORDEN, Barbara TERHEIDEN, Giso HAHN, 2009. Thermal stability of PECVD a-Si1-xCx layers for crystalline silicon solar cell passivation. 24th European Photovoltaic Solar Energy. Hamburg, Sep 2009. In: Proceedings of the 24th European Photovoltaic Solar Energy Conference. 24th European Photovoltaic Solar Energy. Hamburg, Sep 2009. München:WIP - Wirtschaft und Infrastruktur, pp. 1591-1595. Available under: doi: 10.4229/24thEUPVSEC2009-2CV.2.49

@inproceedings{Riegel2009Therm-908, title={Thermal stability of PECVD a-Si1-xCx layers for crystalline silicon solar cell passivation}, year={2009}, doi={10.4229/24thEUPVSEC2009-2CV.2.49}, address={München}, publisher={WIP - Wirtschaft und Infrastruktur}, booktitle={Proceedings of the 24th European Photovoltaic Solar Energy Conference}, pages={1591--1595}, author={Riegel, Stefanie and Raabe, Bernd and Stewart, Michael P. and Mungekar, Hemant and Borden, Peter and Terheiden, Barbara and Hahn, Giso} }

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