The effect of roughness on the T3-dewetting of molecular hydrogen

Angrik, Jörg; Sohaili, Masoud; Klier, Jürgen; Leiderer, Paul

The effect of roughness on the T3-dewetting of molecular hydrogen

Files

316_physicaB_2003.pdf(1.06 MB)

Date

2003

Authors

Angrik, Jörg

Sohaili, Masoud

Klier, Jürgen

Leiderer, Paul

Publication type

Journal article

Published in

Physica / B [Condensed Matter] ; 329 (2003), Part 1. - pp. 435-436

Abstract

Triple-point dewetting is a well-known behaviour of molecular hydrogen and other van der Waals systems like noble gases on a solid substrate. Recent theoretical and experimental investigations (Phys. Rev. Lett. 88 (2002) 55702) suggest that it is caused primarily by the roughness of the substrate. Strain induced due to the mismatch of the lattice constant of the substrate and the growing layers of the adsorbed materials is increased by the micro-roughness of the substrate which eventually leads to the growth of only a thin solid film of the adsorbate. The dominating role of the substrate roughness is demonstrated, e.g., by ellipsometric measurements on smooth Si surfaces (rms 0.15 nm), where a thicker solid hydrogen film than the 3 monolayers on "usual" substrates is observed. We present a way to modify and improve the surface quality of snbstrates for such wetting studies of solid van der Waals films.

Subject (DDC)

530 Physics

Keywords

Triple-point dewetting,MolecuIar hydrogen,Solid films,Surface roughness

Cite This

ISO 690

ANGRIK, Jörg, Masoud SOHAILI, Jürgen KLIER, Paul LEIDERER, 2003. The effect of roughness on the T3-dewetting of molecular hydrogen. In: Physica / B [Condensed Matter]. 329(Part 1), pp. 435-436. Available under: doi: 10.1016/S0921-4526(02)02331-1

BibTex

@article{Angrik2003effec-9079,
  year={2003},
  doi={10.1016/S0921-4526(02)02331-1},
  title={The effect of roughness on the T3-dewetting of molecular hydrogen},
  number={Part 1},
  volume={329},
  journal={Physica / B [Condensed Matter]},
  pages={435--436},
  author={Angrik, Jörg and Sohaili, Masoud and Klier, Jürgen and Leiderer, Paul}
}

RDF

<rdf:RDF
    xmlns:dcterms="http://purl.org/dc/terms/"
    xmlns:dc="http://purl.org/dc/elements/1.1/"
    xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#"
    xmlns:bibo="http://purl.org/ontology/bibo/"
    xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#"
    xmlns:foaf="http://xmlns.com/foaf/0.1/"
    xmlns:void="http://rdfs.org/ns/void#"
    xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > 
  <rdf:Description rdf:about="https://kops.uni-konstanz.de/server/rdf/resource/123456789/9079">
    <dc:contributor>Angrik, Jörg</dc:contributor>
    <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dcterms:bibliographicCitation>First publ. in: Physica / B [Condensed Matter], Vol. 329 (2003), Part 1, pp. 435-436</dcterms:bibliographicCitation>
    <dc:contributor>Sohaili, Masoud</dc:contributor>
    <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/9079/1/316_physicaB_2003.pdf"/>
    <dcterms:rights rdf:resource="http://creativecommons.org/licenses/by-nc-nd/2.0/"/>
    <dc:language>eng</dc:language>
    <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/9079/1/316_physicaB_2003.pdf"/>
    <dcterms:abstract xml:lang="eng">Triple-point dewetting is a well-known behaviour of molecular hydrogen and other van der Waals systems like noble gases on a solid substrate. Recent theoretical and experimental investigations (Phys. Rev. Lett. 88 (2002) 55702) suggest that it is caused primarily by the roughness of the substrate. Strain induced due to the mismatch of the lattice constant of the substrate and the growing layers of the adsorbed materials is increased by the micro-roughness of the substrate which eventually leads to the growth of only a thin solid film of the adsorbate. The dominating role of the substrate roughness is demonstrated, e.g., by ellipsometric measurements on smooth Si surfaces (rms 0.15 nm), where a thicker solid hydrogen film than the 3 monolayers on "usual" substrates is observed. We present a way to modify and improve the surface quality of snbstrates for such wetting studies of solid van der Waals films.</dcterms:abstract>
    <dc:rights>Attribution-NonCommercial-NoDerivs 2.0 Generic</dc:rights>
    <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/9079"/>
    <dc:format>application/pdf</dc:format>
    <dc:creator>Angrik, Jörg</dc:creator>
    <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/server/rdf/resource/123456789/41"/>
    <dc:contributor>Leiderer, Paul</dc:contributor>
    <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T17:53:25Z</dcterms:available>
    <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T17:53:25Z</dc:date>
    <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/>
    <dcterms:issued>2003</dcterms:issued>
    <foaf:homepage rdf:resource="http://localhost:8080/"/>
    <dc:creator>Sohaili, Masoud</dc:creator>
    <dcterms:title>The effect of roughness on the T3-dewetting of molecular hydrogen</dcterms:title>
    <dc:creator>Leiderer, Paul</dc:creator>
    <dc:creator>Klier, Jürgen</dc:creator>
    <dc:contributor>Klier, Jürgen</dc:contributor>
  </rdf:Description>
</rdf:RDF>

Bibliography of Konstanz

Yes