The effect of roughness on the T3-dewetting of molecular hydrogen

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2003
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Angrik, Jörg
Sohaili, Masoud
Klier, Jürgen
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Physica / B [Condensed Matter]. 2003, 329(Part 1), pp. 435-436. Available under: doi: 10.1016/S0921-4526(02)02331-1
Zusammenfassung

Triple-point dewetting is a well-known behaviour of molecular hydrogen and other van der Waals systems like noble gases on a solid substrate. Recent theoretical and experimental investigations (Phys. Rev. Lett. 88 (2002) 55702) suggest that it is caused primarily by the roughness of the substrate. Strain induced due to the mismatch of the lattice constant of the substrate and the growing layers of the adsorbed materials is increased by the micro-roughness of the substrate which eventually leads to the growth of only a thin solid film of the adsorbate. The dominating role of the substrate roughness is demonstrated, e.g., by ellipsometric measurements on smooth Si surfaces (rms 0.15 nm), where a thicker solid hydrogen film than the 3 monolayers on "usual" substrates is observed. We present a way to modify and improve the surface quality of snbstrates for such wetting studies of solid van der Waals films.

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530 Physik
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Triple-point dewetting, MolecuIar hydrogen, Solid films, Surface roughness
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ISO 690ANGRIK, Jörg, Masoud SOHAILI, Jürgen KLIER, Paul LEIDERER, 2003. The effect of roughness on the T3-dewetting of molecular hydrogen. In: Physica / B [Condensed Matter]. 2003, 329(Part 1), pp. 435-436. Available under: doi: 10.1016/S0921-4526(02)02331-1
BibTex
@article{Angrik2003effec-9079,
  year={2003},
  doi={10.1016/S0921-4526(02)02331-1},
  title={The effect of roughness on the T3-dewetting of molecular hydrogen},
  number={Part 1},
  volume={329},
  journal={Physica / B [Condensed Matter]},
  pages={435--436},
  author={Angrik, Jörg and Sohaili, Masoud and Klier, Jürgen and Leiderer, Paul}
}
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