Clustersputtern an optischen Oberflächen


Dateien zu dieser Ressource

Prüfsumme: MD5:59910d60dbf20b716d569da1d3edf11f

OETTINGER, Eva, 2001. Clustersputtern an optischen Oberflächen

@phdthesis{Oettinger2001Clust-8936, title={Clustersputtern an optischen Oberflächen}, year={2001}, author={Oettinger, Eva}, address={Konstanz}, school={Universität Konstanz} }

application/pdf Clustersputtern an optischen Oberflächen deposit-license 2011-03-24T17:52:12Z deu 2001 2011-03-24T17:52:12Z Cluster ion sputtering of optical surfaces Oettinger, Eva This project was sponsored by optical industries. We tried to find out, whether clustersputtering could be a tool for polishing the new generation of optics in EUVL-technologies. So we focused on the surface smoothing effect which appears for ion cluster beam bombardement on different scales of surface roughness. We succeeded in showing the smoothing effect on micrometer-, nanometer- and subnanometer-scale of roughness. For a commercially polished siliconwafer with a roughness-value of RMS=0.24nm we found after clustersputtering a significant reduced surface roughness of only RMS=0.14nm. Analysing the PSD-spectra those smoothing effects for siliconwafers appear for lateral spectral wavelengths > 17nm. For smaller structures of spectral wavelengths less than 17nm the roughness increases. Looking at the results of this work we can deal clustersputtering as a success promissing polishing tool for the new generation of mirror optics in EUVL-technologies. More systematic studies are to be done in the future. Oettinger, Eva

Dateiabrufe seit 01.10.2014 (Informationen über die Zugriffsstatistik)

Clustersputtern.pdf 194

Das Dokument erscheint in:

KOPS Suche


Mein Benutzerkonto