Delay of Regeneration by Adding Aluminum in Boron Doped Crystalline Si

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MEHLER, Melanie, Andreas SCHMID, Annika ZUSCHLAG, Matthias TREMPA, Giso HAHN, 2021. Delay of Regeneration by Adding Aluminum in Boron Doped Crystalline Si. In: Physica Status Solidi (A) : Applications and Materials Science. Wiley. 218(22), pp. 2100603. ISSN 1862-6300. eISSN 1862-6319. Available under: doi: 10.1002/pssa.202100603

@article{Mehler2021-11Delay-55086, title={Delay of Regeneration by Adding Aluminum in Boron Doped Crystalline Si}, year={2021}, doi={10.1002/pssa.202100603}, number={22}, volume={218}, issn={1862-6300}, journal={Physica Status Solidi (A) : Applications and Materials Science}, author={Mehler, Melanie and Schmid, Andreas and Zuschlag, Annika and Trempa, Matthias and Hahn, Giso} }

<rdf:RDF xmlns:dcterms="" xmlns:dc="" xmlns:rdf="" xmlns:bibo="" xmlns:dspace="" xmlns:foaf="" xmlns:void="" xmlns:xsd="" > <rdf:Description rdf:about=""> <dc:creator>Zuschlag, Annika</dc:creator> <dc:contributor>Schmid, Andreas</dc:contributor> <dcterms:issued>2021-11</dcterms:issued> <dc:contributor>Mehler, Melanie</dc:contributor> <dc:contributor>Hahn, Giso</dc:contributor> <dspace:hasBitstream rdf:resource=""/> <dcterms:isPartOf rdf:resource=""/> <dc:language>eng</dc:language> <dspace:isPartOfCollection rdf:resource=""/> <dc:contributor>Trempa, Matthias</dc:contributor> <dc:date rdf:datatype="">2021-09-29T12:06:39Z</dc:date> <bibo:uri rdf:resource=""/> <dc:contributor>Zuschlag, Annika</dc:contributor> <foaf:homepage rdf:resource="http://localhost:8080/jspui"/> <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/> <dcterms:available rdf:datatype="">2021-09-29T12:06:39Z</dcterms:available> <dcterms:rights rdf:resource=""/> <dc:creator>Hahn, Giso</dc:creator> <dc:creator>Mehler, Melanie</dc:creator> <dc:creator>Schmid, Andreas</dc:creator> <dcterms:hasPart rdf:resource=""/> <dcterms:title>Delay of Regeneration by Adding Aluminum in Boron Doped Crystalline Si</dcterms:title> <dc:rights>terms-of-use</dc:rights> <dcterms:abstract xml:lang="eng">In this work, two B-doped Cz-grown Si materials with different Al concentrations are investigated concerning the long-term behavior of excess charge carrier lifetime under injection at elevated temperature. By determining the defect density and the surface saturation current density, a delay in regeneration and a delay in the onset of surface-related degradation is found in the material containing an order of magnitude more Al. Investigations under constant excess carrier concentration reveal that the effect of the delay is still significant, but less pronounced compared to constant generation conditions, so the effect causing the delay seems to be injection-dependent. The findings could be explained by the higher activation energy for the splitting of Al-H pairs compared to splitting of B-H pairs, which might cause a delayed release of H from the dopant-H configuration. Assuming that regeneration depends on this released H, the delay in regeneration could be explained by this model.</dcterms:abstract> <dc:creator>Trempa, Matthias</dc:creator> </rdf:Description> </rdf:RDF>

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