Equilibrium helium films under the influence of surface roughness

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KLIER, Jürgen, Martin ZECH, Armin FUBEL, Paul LEIDERER, Valeri SHIKIN, 2005. Equilibrium helium films under the influence of surface roughness. In: Journal of Low Temperature Physics. 138(1-2), pp. 355-360

@article{Klier2005Equil-5297, title={Equilibrium helium films under the influence of surface roughness}, year={2005}, doi={10.1007/s10909-005-1577-8}, number={1-2}, volume={138}, journal={Journal of Low Temperature Physics}, pages={355--360}, author={Klier, Jürgen and Zech, Martin and Fubel, Armin and Leiderer, Paul and Shikin, Valeri} }

<rdf:RDF xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcterms="http://purl.org/dc/terms/" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/rdf/resource/123456789/5297"> <dc:rights>deposit-license</dc:rights> <dcterms:issued>2005</dcterms:issued> <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/5297"/> <dc:contributor>Fubel, Armin</dc:contributor> <dc:creator>Leiderer, Paul</dc:creator> <dc:contributor>Zech, Martin</dc:contributor> <dcterms:bibliographicCitation>First publ. in: Journal of Low Temperature Physics 138 (2005), 1-2, pp. 355-360</dcterms:bibliographicCitation> <dc:format>application/pdf</dc:format> <dc:creator>Shikin, Valeri</dc:creator> <dc:language>eng</dc:language> <dc:contributor>Shikin, Valeri</dc:contributor> <dc:creator>Zech, Martin</dc:creator> <dcterms:abstract xml:lang="eng">Equilibrium helium flms adsorbed on solid substrates are investigated. Due to their thickness these flms are mainly in the retardation regime where the influence of the roughness of the substrates, ±(x), can be strong enough to be observed. For the definition of ±(x) we use a simple corrugation model. This model is supported by experimental results using the surface plasmon resonance technique to determine the thickness of helium flms grown on diferent Ag surfaces.</dcterms:abstract> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:54:44Z</dcterms:available> <dc:creator>Fubel, Armin</dc:creator> <dc:contributor>Klier, Jürgen</dc:contributor> <dcterms:rights rdf:resource="https://creativecommons.org/licenses/by-nc-nd/2.0/legalcode"/> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:54:44Z</dc:date> <dc:creator>Klier, Jürgen</dc:creator> <dc:contributor>Leiderer, Paul</dc:contributor> <dcterms:title>Equilibrium helium films under the influence of surface roughness</dcterms:title> </rdf:Description> </rdf:RDF>

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