Type of Publication: | Journal article |
Publication status: | Published |
Author: | Gönnenwein, Sebastian T. B.; Zeisel, Roland; Ambacher, Oliver; Brandt, Martin S.; Stutzmann, Martin; Baldovino, Silvia |
Year of publication: | 2001 |
Published in: | Applied Physics Letters ; 79 (2001), 15. - pp. 2396-2398. - American Institute of Physics (AIP). - ISSN 0003-6951. - eISSN 1077-3118 |
DOI (citable link): | https://dx.doi.org/10.1063/1.1405426 |
Summary: |
Generation–recombination noise is observed in Si-doped aluminum nitride (AlN:Si). Both the magnitude and the characteristic frequency of the generation–recombination noise power density are found to be thermally activated. Using a model based on charge carrier number fluctuations in a two-level system, transition energies and potential barriers of the DX center formed by Si donors in AlN are quantitatively determined.
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Subject (DDC): | 530 Physics |
Refereed: | Yes |
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GÖNNENWEIN, Sebastian T. B., Roland ZEISEL, Oliver AMBACHER, Martin S. BRANDT, Martin STUTZMANN, Silvia BALDOVINO, 2001. Generation–recombination noise of DX centers in AlN:Si. In: Applied Physics Letters. American Institute of Physics (AIP). 79(15), pp. 2396-2398. ISSN 0003-6951. eISSN 1077-3118. Available under: doi: 10.1063/1.1405426
@article{Gonnenwein2001Gener-52556, title={Generation–recombination noise of DX centers in AlN:Si}, year={2001}, doi={10.1063/1.1405426}, number={15}, volume={79}, issn={0003-6951}, journal={Applied Physics Letters}, pages={2396--2398}, author={Gönnenwein, Sebastian T. B. and Zeisel, Roland and Ambacher, Oliver and Brandt, Martin S. and Stutzmann, Martin and Baldovino, Silvia} }
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