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A high-sensitivity in situ optical diagnostic technique for laser cleaning of transparent substrates

A high-sensitivity in situ optical diagnostic technique for laser cleaning of transparent substrates

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Prüfsumme: MD5:04b7ad993fb5af581d6601bd12314605

CHAOUI, Nouari, Francisco Javier SOLIS CESPEDES, Carmen Nieves AFONSO RODRIGUEZ, T. FOURRIER, T. MUEHLBERGER, Gernot SCHREMS, Mario MOSBACHER, Dieter BÄUERLE, Micha BERTSCH, Paul LEIDERER, 2003. A high-sensitivity in situ optical diagnostic technique for laser cleaning of transparent substrates. In: Applied Physics A. 76(5), pp. 767-771

@article{Chaoui2003high--5255, title={A high-sensitivity in situ optical diagnostic technique for laser cleaning of transparent substrates}, year={2003}, doi={10.1007/s00339-002-2032-1}, number={5}, volume={76}, journal={Applied Physics A}, pages={767--771}, author={Chaoui, Nouari and Solis Cespedes, Francisco Javier and Afonso Rodriguez, Carmen Nieves and Fourrier, T. and Muehlberger, T. and Schrems, Gernot and Mosbacher, Mario and Bäuerle, Dieter and Bertsch, Micha and Leiderer, Paul} }

<rdf:RDF xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcterms="http://purl.org/dc/terms/" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/rdf/resource/123456789/5255"> <dcterms:bibliographicCitation>First publ. in: Applied Physics A 76 (2003), 5, pp. 767-771</dcterms:bibliographicCitation> <dc:creator>Afonso Rodriguez, Carmen Nieves</dc:creator> <dc:contributor>Solis Cespedes, Francisco Javier</dc:contributor> <dc:contributor>Chaoui, Nouari</dc:contributor> <dcterms:issued>2003</dcterms:issued> <dcterms:rights rdf:resource="https://creativecommons.org/licenses/by-nc-nd/2.0/legalcode"/> <dc:creator>Schrems, Gernot</dc:creator> <dc:contributor>Leiderer, Paul</dc:contributor> <dc:creator>Leiderer, Paul</dc:creator> <dc:contributor>Muehlberger, T.</dc:contributor> <dc:contributor>Afonso Rodriguez, Carmen Nieves</dc:contributor> <dc:creator>Bertsch, Micha</dc:creator> <dcterms:title>A high-sensitivity in situ optical diagnostic technique for laser cleaning of transparent substrates</dcterms:title> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:54:23Z</dcterms:available> <dc:creator>Fourrier, T.</dc:creator> <dc:contributor>Fourrier, T.</dc:contributor> <dc:contributor>Bäuerle, Dieter</dc:contributor> <dc:creator>Mosbacher, Mario</dc:creator> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:54:23Z</dc:date> <dc:creator>Bäuerle, Dieter</dc:creator> <dc:creator>Chaoui, Nouari</dc:creator> <dc:creator>Muehlberger, T.</dc:creator> <dc:contributor>Mosbacher, Mario</dc:contributor> <dc:contributor>Schrems, Gernot</dc:contributor> <dcterms:abstract xml:lang="eng">A differential optical transmission technique has been used to monitor in situ the efficiency of laser cleaning for the removal of sub-micrometer-sized particles on substrates transparent at the monitoring wavelength. This technique has been applied to the removal of sub-micrometer polystyrene particles on polyimide substrates using laser pulses of 30 ps duration at 292 nm while probing the material transmission at 633 nm. The sensitivity achieved -1/104 for the transmission changes induced upon single-pulse laser exposure allows us to monitor the removal of just a few sub-micron-sized particles from the probed region inside the irradiated area.</dcterms:abstract> <dc:rights>deposit-license</dc:rights> <dc:format>application/pdf</dc:format> <dc:language>eng</dc:language> <dc:creator>Solis Cespedes, Francisco Javier</dc:creator> <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/5255"/> <dc:contributor>Bertsch, Micha</dc:contributor> </rdf:Description> </rdf:RDF>

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