Laser cleaning of polymer surfaces


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FOURRIER, T., Gernot SCHREMS, T. MÜHLBERGER, Johannes HEITZ, Nikita ARNOLD, Dieter BÄUERLE, Mario MOSBACHER, Johannes BONEBERG, Paul LEIDERER, 2001. Laser cleaning of polymer surfaces. In: Applied Physics / A, Materials Science and Processing. 72(1), pp. 1-6

@article{Fourrier2001Laser-5253, title={Laser cleaning of polymer surfaces}, year={2001}, doi={10.1007/s003390000683}, number={1}, volume={72}, journal={Applied Physics / A, Materials Science and Processing}, pages={1--6}, author={Fourrier, T. and Schrems, Gernot and Mühlberger, T. and Heitz, Johannes and Arnold, Nikita and Bäuerle, Dieter and Mosbacher, Mario and Boneberg, Johannes and Leiderer, Paul} }

<rdf:RDF xmlns:rdf="" xmlns:bibo="" xmlns:dc="" xmlns:dcterms="" xmlns:xsd="" > <rdf:Description rdf:about=""> <dc:contributor>Boneberg, Johannes</dc:contributor> <dc:creator>Schrems, Gernot</dc:creator> <dc:language>eng</dc:language> <dc:contributor>Heitz, Johannes</dc:contributor> <dc:creator>Leiderer, Paul</dc:creator> <dcterms:title>Laser cleaning of polymer surfaces</dcterms:title> <dc:creator>Heitz, Johannes</dc:creator> <dc:contributor>Leiderer, Paul</dc:contributor> <dc:contributor>Mühlberger, T.</dc:contributor> <dcterms:issued>2001</dcterms:issued> <dc:creator>Mosbacher, Mario</dc:creator> <dc:creator>Bäuerle, Dieter</dc:creator> <dc:creator>Boneberg, Johannes</dc:creator> <dc:creator>Arnold, Nikita</dc:creator> <dc:creator>Fourrier, T.</dc:creator> <dc:rights>deposit-license</dc:rights> <dcterms:bibliographicCitation>First publ. in: Applied Physics / A, Materials Science and Processing, 72 (2001), 1, pp.1-6</dcterms:bibliographicCitation> <dcterms:rights rdf:resource=""/> <dc:contributor>Bäuerle, Dieter</dc:contributor> <dc:contributor>Fourrier, T.</dc:contributor> <dcterms:abstract xml:lang="eng">We have investigated the removal of small spherical particles from polymer surfaces by means of 193-nm ArF and 248-nm KrF laser light. Polystyrene (PS) particles with diameters in the range of 110 nm to 1700 nm and silica particles (SiO2) with sizes of 400 nm and 800 nm are successfully removed from two different substrates, polyimide (PI) and polymethylmethacrylate (PMMA). Experiments were performed in air (23°C, relative humidity 24% 28%) and in an environment with a relative humidity (RH) of about 90%.</dcterms:abstract> <dc:contributor>Mosbacher, Mario</dc:contributor> <dc:contributor>Schrems, Gernot</dc:contributor> <bibo:uri rdf:resource=""/> <dcterms:available rdf:datatype="">2011-03-24T14:54:22Z</dcterms:available> <dc:format>application/pdf</dc:format> <dc:date rdf:datatype="">2011-03-24T14:54:22Z</dc:date> <dc:contributor>Arnold, Nikita</dc:contributor> <dc:creator>Mühlberger, T.</dc:creator> </rdf:Description> </rdf:RDF>

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