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Colloid monolayer lithography : a flexible approach for nanostructuring of surfaces

Colloid monolayer lithography : a flexible approach for nanostructuring of surfaces

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BURMEISTER, Frank, Wilfried BADOWSKY, T. BRAUN, Silvana WIEPRICH, Johannes BONEBERG, Paul LEIDERER, 1999. Colloid monolayer lithography : a flexible approach for nanostructuring of surfaces. In: Applied Surface Science. 144-145, pp. 461-466. Available under: doi: 10.1016/S0169-4332(98)00840-X

@article{Burmeister1999Collo-5211, title={Colloid monolayer lithography : a flexible approach for nanostructuring of surfaces}, year={1999}, doi={10.1016/S0169-4332(98)00840-X}, volume={144-145}, journal={Applied Surface Science}, pages={461--466}, author={Burmeister, Frank and Badowsky, Wilfried and Braun, T. and Wieprich, Silvana and Boneberg, Johannes and Leiderer, Paul} }

<rdf:RDF xmlns:dcterms="http://purl.org/dc/terms/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#" xmlns:foaf="http://xmlns.com/foaf/0.1/" xmlns:void="http://rdfs.org/ns/void#" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/rdf/resource/123456789/5211"> <dc:format>application/pdf</dc:format> <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/5211/1/242_apllsurfsci_1999.pdf"/> <dcterms:issued>1999</dcterms:issued> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:54:04Z</dcterms:available> <dc:language>eng</dc:language> <dc:creator>Badowsky, Wilfried</dc:creator> <dcterms:bibliographicCitation>First publ. in: Applied Surface Science 144-145 (1999), pp. 461-466</dcterms:bibliographicCitation> <dc:contributor>Badowsky, Wilfried</dc:contributor> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:54:04Z</dc:date> <dc:rights>deposit-license</dc:rights> <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/5211"/> <dc:contributor>Burmeister, Frank</dc:contributor> <dc:creator>Wieprich, Silvana</dc:creator> <dcterms:rights rdf:resource="https://creativecommons.org/licenses/by-nc-nd/2.0/legalcode"/> <dc:contributor>Wieprich, Silvana</dc:contributor> <dcterms:abstract xml:lang="eng">In this paper, we report on an alternative nanofabrication method which relies on self-assembly of colloidal particles into a two-dimensional array on surfaces. Some important parameters for obtaining large monolayers of good crystallinity are discussed, i.e., the evaporation rate of the colloid suspension, the surface charge of the particles and the wetting properties of the substrate. The 2D crystals can be utilized as lithographic masks for consecutive processes. This 1s demonstrated with two experiments, site-selective electrochemical deposition of copper on a semiconductor surface and shape modification of small metallic dots by thermal annealing.</dcterms:abstract> <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/> <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/rdf/resource/123456789/41"/> <dc:creator>Burmeister, Frank</dc:creator> <dc:contributor>Boneberg, Johannes</dc:contributor> <dc:creator>Boneberg, Johannes</dc:creator> <dc:creator>Leiderer, Paul</dc:creator> <dc:contributor>Leiderer, Paul</dc:contributor> <dc:contributor>Braun, T.</dc:contributor> <dcterms:title>Colloid monolayer lithography : a flexible approach for nanostructuring of surfaces</dcterms:title> <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/rdf/resource/123456789/41"/> <foaf:homepage rdf:resource="http://localhost:8080/jspui"/> <dc:creator>Braun, T.</dc:creator> <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/5211/1/242_apllsurfsci_1999.pdf"/> </rdf:Description> </rdf:RDF>

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