Infrared steam laser cleaning


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FRANK, Pascal, Florian LANG, Mario MOSBACHER, Johannes BONEBERG, Paul LEIDERER, 2008. Infrared steam laser cleaning. In: Applied Physics / A, Materials Science and Processing. 93(1), pp. 1-4

@article{Frank2008Infra-5147, title={Infrared steam laser cleaning}, year={2008}, doi={10.1007/s00339-008-4651-7}, number={1}, volume={93}, journal={Applied Physics / A, Materials Science and Processing}, pages={1--4}, author={Frank, Pascal and Lang, Florian and Mosbacher, Mario and Boneberg, Johannes and Leiderer, Paul} }

<rdf:RDF xmlns:rdf="" xmlns:bibo="" xmlns:dc="" xmlns:dcterms="" xmlns:xsd="" > <rdf:Description rdf:about=""> <dc:contributor>Frank, Pascal</dc:contributor> <dc:contributor>Lang, Florian</dc:contributor> <dc:rights>deposit-license</dc:rights> <dc:creator>Mosbacher, Mario</dc:creator> <dc:contributor>Mosbacher, Mario</dc:contributor> <dcterms:issued>2008</dcterms:issued> <bibo:uri rdf:resource=""/> <dcterms:title>Infrared steam laser cleaning</dcterms:title> <dcterms:bibliographicCitation>Applied Physics / A, Materials Science and Processing ; 93 (2008), 1. - S. 1-4</dcterms:bibliographicCitation> <dc:date rdf:datatype="">2011-03-24T14:53:32Z</dc:date> <dc:language>eng</dc:language> <dc:creator>Leiderer, Paul</dc:creator> <dcterms:rights rdf:resource=""/> <dc:creator>Frank, Pascal</dc:creator> <dc:contributor>Boneberg, Johannes</dc:contributor> <dc:contributor>Leiderer, Paul</dc:contributor> <dc:format>application/pdf</dc:format> <dcterms:available rdf:datatype="">2011-03-24T14:53:32Z</dcterms:available> <dcterms:abstract xml:lang="eng">Steam Laser Cleaning with a pulsed infrared laser source is investigated. The infrared light is tuned to the absorption maximum of water (λ = 2.94 µm, 10 ns), whereas the substrates used are transparent (glass, silicon). Thus a thin liquid water layer condensed on top of the contaminated substrate is rapidly heated. The pressure generated during the subsequent phase explosion generates a cleaning force which exceeds the adhesion of the particles. We examine the cleaning threshold in single shot experiments for particles sized from 1 µm down to 300 nm.</dcterms:abstract> <dc:creator>Boneberg, Johannes</dc:creator> <dc:creator>Lang, Florian</dc:creator> </rdf:Description> </rdf:RDF>

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