Equilibrium helium film in the thick film limit


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KLIER, Jürgen, Frank SCHLETTERER, Paul LEIDERER, Valeri SHIKIN, 2003. Equilibrium helium film in the thick film limit. In: Fizika Nizkikh Temperatur. 29(9-10), pp. 957-960

@article{Klier2003Equil-5010, title={Equilibrium helium film in the thick film limit}, year={2003}, number={9-10}, volume={29}, journal={Fizika Nizkikh Temperatur}, pages={957--960}, author={Klier, Jürgen and Schletterer, Frank and Leiderer, Paul and Shikin, Valeri} }

Klier, Jürgen For the thickness of a liquid or solid quantum film, like liquid helium or solid hydrogen, there exist still open questions about how the film thickness develops in certain limits. One of these is the thick film limit, i.e., the crossover from the thick film to bulk. We have performed measurements in this range using the surface plasmon resonance technique and an evaporated Ag film deposited on glass as substrate. The thickness of the adsorhed helium film is varied by changing the distance h of the bulk reservoir to the surface of the substrate. In the limiting case, when h -> 0, the film thickness approaches about 100 nm following the wan der Waals law in thc retarded regime. The film thickness and its dependence on h is precisely determined and theoretically modeled. The equilibrium film thickness behaviour is discussed in detail. The agreement between theory and experiment is very good. Schletterer, Frank Schletterer, Frank Klier, Jürgen 2011-03-24T14:52:28Z Shikin, Valeri Leiderer, Paul application/pdf Equilibrium helium film in the thick film limit Leiderer, Paul 2003 deposit-license 2011-03-24T14:52:28Z eng First publ. in: Fizika Nizkikh Temperatur 29 (2003), 9-10, pp. 957-960 Shikin, Valeri

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