Aufgrund von Vorbereitungen auf eine neue Version von KOPS, können am Montag, 6.2. und Dienstag, 7.2. keine Publikationen eingereicht werden. (Due to preparations for a new version of KOPS, no publications can be submitted on Monday, Feb. 6 and Tuesday, Feb. 7.)

Interface Engineering to Create a Strong Spin Filter Contact to Silicon

Cite This

Files in this item

Checksum: MD5:40bd2f302e42536a58fa67e69ff3e8a6

CASPERS, Christian, Andrei GLOSKOVSKII, Mihaela GORGOI, Claire BESSON, Martina LUYSBERG, Konstantin Z. RUSHCHANSKII, Marjana LEŽAIĆ, Charles S. FADLEY, Wolfgang DRUBE, Martina MÜLLER, 2016. Interface Engineering to Create a Strong Spin Filter Contact to Silicon. In: Scientific reports. Springer Nature. 6(1), 22912. eISSN 2045-2322. Available under: doi: 10.1038/srep22912

@article{Caspers2016-03-15Inter-49987, title={Interface Engineering to Create a Strong Spin Filter Contact to Silicon}, year={2016}, doi={10.1038/srep22912}, number={1}, volume={6}, journal={Scientific reports}, author={Caspers, Christian and Gloskovskii, Andrei and Gorgoi, Mihaela and Besson, Claire and Luysberg, Martina and Rushchanskii, Konstantin Z. and Ležaić, Marjana and Fadley, Charles S. and Drube, Wolfgang and Müller, Martina}, note={11 pages of scientific paper, 10 high-resolution color figures. Supplemental information on the thermodynamic problem available (PDF). High-resolution abstract graphic available (PNG). Original research (2016) Article Number: 22912} }

<rdf:RDF xmlns:dcterms="" xmlns:dc="" xmlns:rdf="" xmlns:bibo="" xmlns:dspace="" xmlns:foaf="" xmlns:void="" xmlns:xsd="" > <rdf:Description rdf:about=""> <dc:contributor>Drube, Wolfgang</dc:contributor> <dc:creator>Fadley, Charles S.</dc:creator> <dcterms:rights rdf:resource=""/> <dcterms:available rdf:datatype="">2020-06-24T09:19:46Z</dcterms:available> <dspace:isPartOfCollection rdf:resource=""/> <dc:contributor>Fadley, Charles S.</dc:contributor> <dc:contributor>Müller, Martina</dc:contributor> <dc:creator>Luysberg, Martina</dc:creator> <dcterms:isPartOf rdf:resource=""/> <dc:creator>Müller, Martina</dc:creator> <dc:contributor>Gloskovskii, Andrei</dc:contributor> <dc:contributor>Rushchanskii, Konstantin Z.</dc:contributor> <dc:date rdf:datatype="">2020-06-24T09:19:46Z</dc:date> <dc:language>eng</dc:language> <dc:creator>Besson, Claire</dc:creator> <dc:contributor>Ležaić, Marjana</dc:contributor> <bibo:uri rdf:resource=""/> <dc:creator>Ležaić, Marjana</dc:creator> <dcterms:abstract xml:lang="eng">Integrating epitaxial and ferromagnetic Europium Oxide (EuO) directly on silicon is a perfect route to enrich silicon nanotechnology with spin filter functionality. To date, the inherent chemical reactivity between EuO and Si has prevented a heteroepitaxial integration without significant contaminations of the interface with Eu silicides and Si oxides. We present a solution to this long-standing problem by applying two complementary passivation techniques for the reactive EuO/Si interface: (i) an in situ hydrogen-Si (001) passivation and (ii) the application of oxygen-protective Eu monolayers-without using any additional buffer layers. By careful chemical depth profiling of the oxide-semiconductor interface via hard x-ray photoemission spectroscopy, we show how to systematically minimize both Eu silicide and Si oxide formation to the sub-monolayer regime-and how to ultimately interface-engineer chemically clean, heteroepitaxial and ferromagnetic EuO/Si (001) in order to create a strong spin filter contact to silicon.</dcterms:abstract> <dc:contributor>Luysberg, Martina</dc:contributor> <dc:contributor>Caspers, Christian</dc:contributor> <dc:rights>Attribution 4.0 International</dc:rights> <foaf:homepage rdf:resource="http://localhost:8080/jspui"/> <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/> <dcterms:issued>2016-03-15</dcterms:issued> <dc:creator>Gorgoi, Mihaela</dc:creator> <dspace:hasBitstream rdf:resource=""/> <dcterms:hasPart rdf:resource=""/> <dc:creator>Caspers, Christian</dc:creator> <dc:creator>Rushchanskii, Konstantin Z.</dc:creator> <dc:contributor>Besson, Claire</dc:contributor> <dcterms:title>Interface Engineering to Create a Strong Spin Filter Contact to Silicon</dcterms:title> <dc:contributor>Gorgoi, Mihaela</dc:contributor> <dc:creator>Drube, Wolfgang</dc:creator> <dc:creator>Gloskovskii, Andrei</dc:creator> </rdf:Description> </rdf:RDF>

Downloads since Jun 24, 2020 (Information about access statistics)

Caspers_2-1sz2jgflbuwix5.pdf 168

This item appears in the following Collection(s)

Attribution 4.0 International Except where otherwise noted, this item's license is described as Attribution 4.0 International

Search KOPS


My Account