## Dynamic particle removal by nanosecond dry laser cleaning : theory

2002
Arnold, Nikita
Schrems, Gernot
Mühlberger, T.
Bertsch, Micha
Bäuerle, Dieter
##### Publication type
Contribution to a conference collection
##### Published in
Second International Symposium on Laser Precision Microfabrication / Miyamoto, Isamu; Lu, Yong Feng; Sugioka, Koji; Dubowski, Jan J. (ed.). - SPIE, 2002. - (SPIE Proceedings ; 4426). - pp. 340-346
##### Abstract
A model for ns dry laser cleaning that treats the substrate and particle expansion on a unified basis is suggested. Formulas for the time-dependent thermal of the substrate, valid for temperature-dependent parameters are derived. Van der Waals adhesion , the elasticity of the substrate and particle, as well as particle inertia is taken into account for an arbitrary temporal profile of the laser pulse. Time scale related to the size of the particles and the adhesion/elastic constants is revealed. Cleaning proceeds in different regimes if the duration of the laser pulse is much shorter/longer that this characteristic time. Expressions for cleaning thresholds are provided and compared with experiments on the cleaning of Si surfaces from spherical SiO2 particles with radii between 200 and 2585 nm in vacuum with 248 nm KrF excimer laser and 532 nm frequency doubled Nd-YAG laser. Large discrepancies between the experimental data and theoretical results for KrF laser suggest that ns dry laser cleaning cannot be explained on the basis of thermal expansion mechanism alone.
530 Physics
##### Conference
Second International Symposium on Laser Precision Micromachining, Singapore, Singapore
##### Cite This
ISO 690ARNOLD, Nikita, Gernot SCHREMS, T. MÜHLBERGER, Micha BERTSCH, Mario MOSBACHER, Paul LEIDERER, Dieter BÄUERLE, 2002. Dynamic particle removal by nanosecond dry laser cleaning : theory. Second International Symposium on Laser Precision Micromachining. Singapore, Singapore. In: MIYAMOTO, Isamu, ed., Yong Feng LU, ed., Koji SUGIOKA, ed., Jan J. DUBOWSKI, ed.. Second International Symposium on Laser Precision Microfabrication. SPIE, pp. 340-346. Available under: doi: 10.1117/12.456828
BibTex
@inproceedings{Arnold2002-02-25Dynam-4893,
year={2002},
doi={10.1117/12.456828},
title={Dynamic particle removal by nanosecond dry laser cleaning : theory},
number={4426},
publisher={SPIE},
series={SPIE Proceedings},
booktitle={Second International Symposium on Laser Precision Microfabrication},
pages={340--346},
editor={Miyamoto, Isamu and Lu, Yong Feng and Sugioka, Koji and Dubowski, Jan J.},
author={Arnold, Nikita and Schrems, Gernot and Mühlberger, T. and Bertsch, Micha and Mosbacher, Mario and Leiderer, Paul and Bäuerle, Dieter}
}

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<dcterms:abstract xml:lang="eng">A model for ns dry laser cleaning that treats the substrate and particle expansion on a unified basis is suggested. Formulas for the time-dependent thermal of the substrate, valid for temperature-dependent parameters are derived. Van der Waals adhesion , the elasticity of the substrate and particle, as well as particle inertia is taken into account for an arbitrary temporal profile of the laser pulse. Time scale related to the size of the particles and the adhesion/elastic constants is revealed. Cleaning proceeds in different regimes if the duration of the laser pulse is much shorter/longer that this characteristic time. Expressions for cleaning thresholds are provided and compared with experiments on the cleaning  of Si surfaces from spherical SiO2 particles with radii between 200 and 2585 nm in vacuum with 248 nm KrF excimer laser and 532 nm frequency doubled Nd-YAG laser. Large discrepancies between the experimental data and theoretical results for KrF laser suggest that ns dry laser cleaning cannot be explained on the basis of thermal expansion mechanism alone.</dcterms:abstract>
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<dcterms:bibliographicCitation>First publ. in: Second International Symposium on Laser Precision Microfabrication, Proceedings of SPIE, Vol. 4426, pp. 340-346</dcterms:bibliographicCitation>
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