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Oxidation of deposited Aun (n = 2-13) on Si02 /Si : influence of the NaOH(aq) treatment

Oxidation of deposited Aun (n = 2-13) on Si02 /Si : influence of the NaOH(aq) treatment

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LIM, Dong Chan, Rainer DIETSCHE, Gerd GANTEFÖR, Young Dok KIM, 2009. Oxidation of deposited Aun (n = 2-13) on Si02 /Si : influence of the NaOH(aq) treatment. In: Chemical physics. 359(1-3), pp. 161-165. Available under: doi: 10.1016/j.chemphys.2009.03.023

@article{Lim2009Oxida-4671, title={Oxidation of deposited Aun (n = 2-13) on Si02 /Si : influence of the NaOH(aq) treatment}, year={2009}, doi={10.1016/j.chemphys.2009.03.023}, number={1-3}, volume={359}, journal={Chemical physics}, pages={161--165}, author={Lim, Dong Chan and Dietsche, Rainer and Ganteför, Gerd and Kim, Young Dok} }

<rdf:RDF xmlns:dcterms="http://purl.org/dc/terms/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#" xmlns:foaf="http://xmlns.com/foaf/0.1/" xmlns:void="http://rdfs.org/ns/void#" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/rdf/resource/123456789/4671"> <foaf:homepage rdf:resource="http://localhost:8080/jspui"/> <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/> <dc:creator>Ganteför, Gerd</dc:creator> <dc:contributor>Kim, Young Dok</dc:contributor> <dcterms:hasPart rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/4671/1/20110128_093940.pdf"/> <dcterms:rights rdf:resource="http://nbn-resolving.org/urn:nbn:de:bsz:352-20140905103416863-3868037-7"/> <dc:contributor>Ganteför, Gerd</dc:contributor> <dcterms:issued>2009</dcterms:issued> <dc:creator>Lim, Dong Chan</dc:creator> <dcterms:bibliographicCitation>First publ. in: Chemical physics 359 (2009), 1-3, pp. 161-165</dcterms:bibliographicCitation> <dc:language>eng</dc:language> <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/4671"/> <dc:rights>deposit-license</dc:rights> <dc:contributor>Lim, Dong Chan</dc:contributor> <dcterms:abstract xml:lang="eng">Au cluster anions consisting of 2-13 atoms were soft-landed on native-oxide-covered Si wafers. Reaction of soft-landed clusters with an atomic oxygen atmosphere was studied using X-ray photoelectron spectroscopy (XPS). Au5, Au7 and Au13 turned out to show pronounced inertness for Au-oxide formation. When the samples with deposited Au clusters were treated with aqueous NaOH. the inert Aus. Au7, and Au13 clusters became reactive towards Au-oxide formation. whereas the other originally reactive clusters became inert. This result can be interpreted in terms of electronic modification of Au clusters by Na. which was also evidenced by Au 4f and Na 1s core level shifts.</dcterms:abstract> <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/rdf/resource/123456789/41"/> <dspace:hasBitstream rdf:resource="https://kops.uni-konstanz.de/bitstream/123456789/4671/1/20110128_093940.pdf"/> <dc:creator>Dietsche, Rainer</dc:creator> <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/rdf/resource/123456789/41"/> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:49:27Z</dc:date> <dc:creator>Kim, Young Dok</dc:creator> <dc:contributor>Dietsche, Rainer</dc:contributor> <dc:format>application/pdf</dc:format> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-03-24T14:49:27Z</dcterms:available> <dcterms:title>Oxidation of deposited Aun (n = 2-13) on Si02 /Si : influence of the NaOH(aq) treatment</dcterms:title> </rdf:Description> </rdf:RDF>

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