Advanced scanning probe lithography using anatase-to-rutile transition to create localized TiO₂ nanorods

Abstract

In this article, we demonstrate the position-controlled hydrothermal growth of rutile TiO₂ nanorods using a new scanning probe lithography method in which a silicon tip, commonly used for atomic force microscopy, was pulled across an anatase TiO₂ film. This process scratches the film causing tiny anatase TiO₂ nanoparticles to form on the surface. According to previous reports, these anatase particles convert into rutile nanocrystals and provide the growth of rutile TiO₂ nanorods in well-defined areas. Due to the small tip radius, the resolution of this method is excellent and the method is quite inexpensive compared to electron-beam lithography and similar methods providing a position-controlled growth of semiconducting TiO₂ nanostructures.