Model based prediction of the trap limited diffusion of hydrogen in post-hydrogenated amorphous silicon
| Publikationstyp: | Zeitschriftenartikel |
| Publikationsstatus: | Published |
| Autor/innen: | Gerke, Sebastian; Becker, Hans-Werner; Rogalla, Detlef; Job, Reinhart; Terheiden, Barbara |
| Erscheinungsjahr: | 2016 |
| Erschienen in: | Physica Status Solidi (RRL) - Rapid Research Letters ; 10 (2016), 11. - S. 828-832. - ISSN 1862-6270. - eISSN 1862-6254 |
| DOI (zitierfähiger Link): | https://dx.doi.org/10.1002/pssr.201600303 |
| Fachgebiet (DDC): | 530 Physik |
| Schlagwörter: | amorphous silicon, hydrogen, diffusion, thin films, nuclear resonant reaction |
| Universitätsbibliographie: | Ja |
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GERKE, Sebastian, Hans-Werner BECKER, Detlef ROGALLA, Reinhart JOB, Barbara TERHEIDEN, 2016. Model based prediction of the trap limited diffusion of hydrogen in post-hydrogenated amorphous silicon. In: Physica Status Solidi (RRL) - Rapid Research Letters. 10(11), pp. 828-832. ISSN 1862-6270. eISSN 1862-6254. Available under: doi: 10.1002/pssr.201600303
@article{Gerke2016-11Model-40029, title={Model based prediction of the trap limited diffusion of hydrogen in post-hydrogenated amorphous silicon}, year={2016}, doi={10.1002/pssr.201600303}, number={11}, volume={10}, issn={1862-6270}, journal={Physica Status Solidi (RRL) - Rapid Research Letters}, pages={828--832}, author={Gerke, Sebastian and Becker, Hans-Werner and Rogalla, Detlef and Job, Reinhart and Terheiden, Barbara} }
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