Model based prediction of the trap limited diffusion of hydrogen in post-hydrogenated amorphous silicon
| Type of Publication: | Journal article |
| Publication status: | Published |
| Author: | Gerke, Sebastian; Becker, Hans-Werner; Rogalla, Detlef; Job, Reinhart; Terheiden, Barbara |
| Year of publication: | 2016 |
| Published in: | Physica Status Solidi (RRL) - Rapid Research Letters ; 10 (2016), 11. - pp. 828-832. - ISSN 1862-6270. - eISSN 1862-6254 |
| DOI (citable link): | https://dx.doi.org/10.1002/pssr.201600303 |
| Subject (DDC): | 530 Physics |
| Keywords: | amorphous silicon, hydrogen, diffusion, thin films, nuclear resonant reaction |
| Bibliography of Konstanz: | Yes |
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GERKE, Sebastian, Hans-Werner BECKER, Detlef ROGALLA, Reinhart JOB, Barbara TERHEIDEN, 2016. Model based prediction of the trap limited diffusion of hydrogen in post-hydrogenated amorphous silicon. In: Physica Status Solidi (RRL) - Rapid Research Letters. 10(11), pp. 828-832. ISSN 1862-6270. eISSN 1862-6254. Available under: doi: 10.1002/pssr.201600303
@article{Gerke2016-11Model-40029, title={Model based prediction of the trap limited diffusion of hydrogen in post-hydrogenated amorphous silicon}, year={2016}, doi={10.1002/pssr.201600303}, number={11}, volume={10}, issn={1862-6270}, journal={Physica Status Solidi (RRL) - Rapid Research Letters}, pages={828--832}, author={Gerke, Sebastian and Becker, Hans-Werner and Rogalla, Detlef and Job, Reinhart and Terheiden, Barbara} }
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