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Amorphous Si/SiN double layers : a low-temperature passivation method for diffused phosphorus as well as boron emitters

Amorphous Si/SiN double layers : a low-temperature passivation method for diffused phosphorus as well as boron emitters

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PLAGWITZ, Heiko, Y. TAKAHASHI, Barbara TERHEIDEN, Rolf BRENDEL, 2006. Amorphous Si/SiN double layers : a low-temperature passivation method for diffused phosphorus as well as boron emitters. 21st European Photovoltaic Solar Energy Conference. Dresden, 4. Sep 2006 - 8. Sep 2006. In: 21st European Photovoltaic Solar Energy Conference : proceedings of the international conference held in Dresden, Germany, 4 - 8 September 2006. 21st European Photovoltaic Solar Energy Conference. Dresden, 4. Sep 2006 - 8. Sep 2006. München:WIP Renewable Energies, pp. 688-691. ISBN 3-936338-20-5

@inproceedings{Plagwitz2006Amorp-33125, title={Amorphous Si/SiN double layers : a low-temperature passivation method for diffused phosphorus as well as boron emitters}, year={2006}, isbn={3-936338-20-5}, address={München}, publisher={WIP Renewable Energies}, booktitle={21st European Photovoltaic Solar Energy Conference : proceedings of the international conference held in Dresden, Germany, 4 - 8 September 2006}, pages={688--691}, author={Plagwitz, Heiko and Takahashi, Y. and Terheiden, Barbara and Brendel, Rolf} }

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