Growth modes of thin films of ligand-free metal clusters

Dollinger, Andreas; Strobel, Christoph H.; Bleuel, Hannes; Marsteller, Alexander; Ganteför, Gerd; Fairbrother, D. Howard; Tang, Xin; Bowen, Kit H.; Kim, Young Dok

doi:10.1063/1.4921184

Startseite
→
Physik
→
Physik
→
Dokumentanzeige

Growth modes of thin films of ligand-free metal clusters

Publikationstyp:	Zeitschriftenartikel
URI (zitierfähiger Link):	http://nbn-resolving.de/urn:nbn:de:bsz:352-0-290540
Autor/innen:	Dollinger, Andreas; Strobel, Christoph H.; Bleuel, Hannes; Marsteller, Alexander; Ganteför, Gerd; Fairbrother, D. Howard; Tang, Xin; Bowen, Kit H.; Kim, Young Dok
Erscheinungsjahr:	2015
Erschienen in:	Journal of Applied Physics ; 117 (2015), 19. - 195302. - ISSN 0021-8979. - eISSN 1089-7550
DOI (zitierfähiger Link):	https://dx.doi.org/10.1063/1.4921184
Zusammenfassung:	Size-selected Mo _n ⁻, W_n ⁻, and Fe_n ⁻cluster anions are deposited on a weakly interacting substrate (highly oriented pyrolytic graphite) and studied ex-situ using atomic force microscopy. Depending on size, three growth modes can be distinguished. Very small clusters consisting of less than 10–30 atoms behave similar to atoms and coalesce into 3-dimensional bulk-like islands. Medium sized clusters consisting of hundreds of atoms do not coalesce and follow a Stanski-Krastanov growth pattern. At low coverage, an almost perfect monolayer is formed. This is a new finding different from all previous studies on deposited metal clusters. For clusters with several thousands of atoms, the growth pattern again changes. At low coverage, the substrate is dotted with individual clusters, while at high coverage, the surface becomes extremely rough.
Fachgebiet (DDC):	530 Physik
Schlagwörter:	Thin film growth, Monolayers, Atomic force microscopy, Metal surfaces, Molybdenum
Link zur Lizenz:	Deposit-Lizenz
Universitätsbibliographie:	Ja
Dieser Beitrag ist im Zusammenhang des Rechteinhabers aufgrund einer (DFG-geförderten) Allianz- bzw. Nationallizenz frei zugänglich.

Zitieren

Dateien zu dieser Ressource

Name: Dollinger_0-290540.pdf

Größe: 1.235Mb

Format: PDF

Öffnen

Prüfsumme: MD5:ffafa0a0fe928ac8ac2318f20ec41833

DOLLINGER, Andreas, Christoph H. STROBEL, Hannes BLEUEL, Alexander MARSTELLER, Gerd GANTEFÖR, D. Howard FAIRBROTHER, Xin TANG, Kit H. BOWEN, Young Dok KIM, 2015. Growth modes of thin films of ligand-free metal clusters. In: Journal of Applied Physics. 117(19), 195302. ISSN 0021-8979. eISSN 1089-7550

@article{Dollinger2015Growt-31508, title={Growth modes of thin films of ligand-free metal clusters}, year={2015}, doi={10.1063/1.4921184}, number={19}, volume={117}, issn={0021-8979}, journal={Journal of Applied Physics}, author={Dollinger, Andreas and Strobel, Christoph H. and Bleuel, Hannes and Marsteller, Alexander and Ganteför, Gerd and Fairbrother, D. Howard and Tang, Xin and Bowen, Kit H. and Kim, Young Dok}, note={Article Number: 195302} }

Strobel, Christoph H. Bleuel, Hannes Marsteller, Alexander Growth modes of thin films of ligand-free metal clusters Tang, Xin Dollinger, Andreas Ganteför, Gerd Kim, Young Dok Marsteller, Alexander Tang, Xin Bleuel, Hannes eng 2015-07-28T05:46:03Z Ganteför, Gerd Size-selected Mo n −, Wn −, and Fen − cluster anions are deposited on a weakly interacting substrate (highly oriented pyrolytic graphite) and studied ex-situ using atomic force microscopy. Depending on size, three growth modes can be distinguished. Very small clusters consisting of less than 10–30 atoms behave similar to atoms and coalesce into 3-dimensional bulk-like islands. Medium sized clusters consisting of hundreds of atoms do not coalesce and follow a Stanski-Krastanov growth pattern. At low coverage, an almost perfect monolayer is formed. This is a new finding different from all previous studies on deposited metal clusters. For clusters with several thousands of atoms, the growth pattern again changes. At low coverage, the substrate is dotted with individual clusters, while at high coverage, the surface becomes extremely rough. 2015 Strobel, Christoph H. 2015-07-28T05:46:03Z Bowen, Kit H. Dollinger, Andreas Fairbrother, D. Howard Fairbrother, D. Howard Kim, Young Dok Bowen, Kit H.