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Influence of the bubbler temperature on PSG and emitter formation during the POCL3 diffusion process

Influence of the bubbler temperature on PSG and emitter formation during the POCL3 diffusion process

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STEYER, Michael, Amir DASTGHEIB-SHIRAZI, Gabriel MICARD, Hannes WAGNER, Pietro P. ALTERMATT, Giso HAHN, 2014. Influence of the bubbler temperature on PSG and emitter formation during the POCL3 diffusion process. European Photovoltaic Solar Energy Conference and Exhibition ; 29. Amsterdam, 22. Sep 2014 - 26. Sep 2014. In: WIP, , ed., ED. BY T. P. BOKHOVEN ..., ed.. Proc. 29th EU PVSEC, Amsterdam. European Photovoltaic Solar Energy Conference and Exhibition ; 29. Amsterdam, 22. Sep 2014 - 26. Sep 2014. München:WIP, pp. 1104-1106. ISSN 2196-100X. ISBN 3-936338-34-5

@inproceedings{Steyer2014Influ-31261, title={Influence of the bubbler temperature on PSG and emitter formation during the POCL3 diffusion process}, year={2014}, doi={10.4229/EUPVSEC20142014-2AV.3.56}, isbn={3-936338-34-5}, issn={2196-100X}, address={München}, publisher={WIP}, booktitle={Proc. 29th EU PVSEC, Amsterdam}, pages={1104--1106}, editor={WIP and ed. by T. P. Bokhoven ...}, author={Steyer, Michael and Dastgheib-Shirazi, Amir and Micard, Gabriel and Wagner, Hannes and Altermatt, Pietro P. and Hahn, Giso} }

<rdf:RDF xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcterms="http://purl.org/dc/terms/" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/rdf/resource/123456789/31261"> <dc:contributor>Micard, Gabriel</dc:contributor> <dcterms:title>Influence of the bubbler temperature on PSG and emitter formation during the POCL3 diffusion process</dcterms:title> <dc:creator>Steyer, Michael</dc:creator> <dcterms:abstract xml:lang="eng">In this work we focus on the emitter formation and its dopant source, the PhosphoSilicate Glass (PSG), formed by POCl3 diffusion. An optimum emitter requires an exact adjustment of diffusion parameters, such as process temperature, time, POCl3-N2 gas flow and O2 gas flow. Another important process parameter which is normally kept constant but also has a strong influence on PSG and emitter formation, is the temperature of the POCl3 bubbler. We characterise PSG and emitter in dependence of the bubbler temperature, within a temperature range from 15.5°C to 24.5°C. PSG thickness varies in respect to bubbler temperature from 29 nm to 33 nm, which is a remarkably narrow range. Further, the total amount of phosphorus in the PSG is measured using ICP-OES. By combination of measured PSG thickness and its P dose, we determine a lower limit for P concentration in the PSG for different bubbler temperatures. On the other hand, the emitter is characterised by the active doping profile, measured by ECV. The plateau depth of these profiles depend clearly on the bubbler temperature. In addition, we show the influence of bubbler temperature on the emitter saturation current density. Finally, the effect of the bubbler temperature has been transferred to industrial screen-printed 6-inch solar cells.</dcterms:abstract> <dc:language>eng</dc:language> <dcterms:rights rdf:resource="http://nbn-resolving.de/urn:nbn:de:bsz:352-20150914100631302-4485392-8"/> <dc:contributor>Hahn, Giso</dc:contributor> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2015-06-24T08:55:03Z</dcterms:available> <dc:contributor>Dastgheib-Shirazi, Amir</dc:contributor> <dc:contributor>Altermatt, Pietro P.</dc:contributor> <dc:contributor>Wagner, Hannes</dc:contributor> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2015-06-24T08:55:03Z</dc:date> <dc:creator>Altermatt, Pietro P.</dc:creator> <dc:creator>Dastgheib-Shirazi, Amir</dc:creator> <dcterms:issued>2014</dcterms:issued> <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/31261"/> <dc:creator>Hahn, Giso</dc:creator> <dc:contributor>Steyer, Michael</dc:contributor> <dc:creator>Wagner, Hannes</dc:creator> <dc:creator>Micard, Gabriel</dc:creator> </rdf:Description> </rdf:RDF>

Dateiabrufe seit 24.06.2015 (Informationen über die Zugriffsstatistik)

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