Pulsed Laser Interference Lithography : Principles and Applications

Zitieren

Dateien zu dieser Ressource

Dateien Größe Format Anzeige

Zu diesem Dokument gibt es keine Dateien.

RIEDEL, Stephen, Tobias GELDHAUSER, Elke SCHEER, Paul LEIDERER, F. ENDERLE, Alfred PLETTL, Johannes BONEBERG, 2013. Pulsed Laser Interference Lithography : Principles and Applications. In: SCHIMMEL, Thomas, ed. and others. Advances in nanotechnology - physics, chemistry, and biology of nanostructures : results of the third research programme Kompetenznetz "Funktionelle Nanostrukturen "(Competence Network on Functional Nanostructures). Stuttgart:Baden-Württemberg Stiftung, pp. 355-372. ISBN 978-3-00-039257-3

@incollection{Riedel2013Pulse-26667, title={Pulsed Laser Interference Lithography : Principles and Applications}, year={2013}, isbn={978-3-00-039257-3}, address={Stuttgart}, publisher={Baden-Württemberg Stiftung}, booktitle={Advances in nanotechnology - physics, chemistry, and biology of nanostructures : results of the third research programme Kompetenznetz "Funktionelle Nanostrukturen "(Competence Network on Functional Nanostructures)}, pages={355--372}, editor={Schimmel, Thomas}, author={Riedel, Stephen and Geldhauser, Tobias and Scheer, Elke and Leiderer, Paul and Enderle, F. and Plettl, Alfred and Boneberg, Johannes} }

<rdf:RDF xmlns:dcterms="http://purl.org/dc/terms/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dspace="http://digital-repositories.org/ontologies/dspace/0.1.0#" xmlns:foaf="http://xmlns.com/foaf/0.1/" xmlns:void="http://rdfs.org/ns/void#" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/rdf/resource/123456789/26667"> <dc:contributor>Boneberg, Johannes</dc:contributor> <dc:rights>deposit-license</dc:rights> <dc:creator>Enderle, F.</dc:creator> <dcterms:bibliographicCitation>Advances in nanotechnology - physics, chemistry, and biology of nanostructures : results of the third research programme Kompetenznetz "Funktionelle Nanostrukturen" (Competence Network on Functional Nanostructures) / Thomas Schimmel ... (Hrgs.). - Stuttgart : Baden-Württemberg Stiftung, 2013. - S. 355-372. - ISBN 978-3-00-039257-3</dcterms:bibliographicCitation> <dc:creator>Leiderer, Paul</dc:creator> <dc:contributor>Geldhauser, Tobias</dc:contributor> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2014-03-05T20:40:33Z</dc:date> <dc:contributor>Scheer, Elke</dc:contributor> <dcterms:rights rdf:resource="http://nbn-resolving.org/urn:nbn:de:bsz:352-20140905103605204-4002607-1"/> <dc:contributor>Enderle, F.</dc:contributor> <dc:contributor>Leiderer, Paul</dc:contributor> <dc:contributor>Riedel, Stephen</dc:contributor> <dc:contributor>Plettl, Alfred</dc:contributor> <dc:creator>Riedel, Stephen</dc:creator> <dc:creator>Plettl, Alfred</dc:creator> <dc:creator>Geldhauser, Tobias</dc:creator> <dspace:isPartOfCollection rdf:resource="https://kops.uni-konstanz.de/rdf/resource/123456789/41"/> <dc:creator>Boneberg, Johannes</dc:creator> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2014-03-05T20:40:33Z</dcterms:available> <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/> <dc:language>eng</dc:language> <dcterms:issued>2013</dcterms:issued> <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/26667"/> <dcterms:title>Pulsed Laser Interference Lithography : Principles and Applications</dcterms:title> <dcterms:isPartOf rdf:resource="https://kops.uni-konstanz.de/rdf/resource/123456789/41"/> <dc:creator>Scheer, Elke</dc:creator> <foaf:homepage rdf:resource="http://localhost:8080/jspui"/> </rdf:Description> </rdf:RDF>

Das Dokument erscheint in:

KOPS Suche


Stöbern

Mein Benutzerkonto