Aufgrund von Vorbereitungen auf eine neue Version von KOPS, können derzeit keine Publikationen eingereicht werden. (Due to preparations for a new version of KOPS, no publications can be submitted currently.)

Silicon diffusion in aluminum for rear passivated solar cells

Cite This

Files in this item

Files Size Format View

There are no files associated with this item.

URREJOLA, Elias, Kristian PETER, Heiko PLAGWITZ, Gunnar SCHUBERT, 2011. Silicon diffusion in aluminum for rear passivated solar cells. In: Applied Physics Letters. 98(15), 153508. ISSN 0003-6951. Available under: doi: 10.1063/1.3579541

@article{Urrejola2011Silic-19492, title={Silicon diffusion in aluminum for rear passivated solar cells}, year={2011}, doi={10.1063/1.3579541}, number={15}, volume={98}, issn={0003-6951}, journal={Applied Physics Letters}, author={Urrejola, Elias and Peter, Kristian and Plagwitz, Heiko and Schubert, Gunnar}, note={Article Number: 153508} }

<rdf:RDF xmlns:dcterms="" xmlns:dc="" xmlns:rdf="" xmlns:bibo="" xmlns:dspace="" xmlns:foaf="" xmlns:void="" xmlns:xsd="" > <rdf:Description rdf:about=""> <dc:contributor>Peter, Kristian</dc:contributor> <dspace:isPartOfCollection rdf:resource=""/> <dcterms:bibliographicCitation>Publ. in: Applied Physics Letters ; 98 (2011), 15. - 153508</dcterms:bibliographicCitation> <dc:creator>Urrejola, Elias</dc:creator> <dc:rights>terms-of-use</dc:rights> <dc:creator>Plagwitz, Heiko</dc:creator> <dcterms:rights rdf:resource=""/> <dcterms:isPartOf rdf:resource=""/> <void:sparqlEndpoint rdf:resource="http://localhost/fuseki/dspace/sparql"/> <bibo:uri rdf:resource=""/> <dc:creator>Schubert, Gunnar</dc:creator> <dc:contributor>Plagwitz, Heiko</dc:contributor> <dcterms:available rdf:datatype="">2012-06-14T20:02:11Z</dcterms:available> <dcterms:title>Silicon diffusion in aluminum for rear passivated solar cells</dcterms:title> <dc:contributor>Urrejola, Elias</dc:contributor> <dcterms:isPartOf rdf:resource=""/> <dc:creator>Peter, Kristian</dc:creator> <dc:date rdf:datatype="">2012-06-14T20:02:11Z</dc:date> <dcterms:issued>2011</dcterms:issued> <dcterms:abstract xml:lang="eng">We show that the lateral spread of silicon in a screen-printed aluminum layer increases by (1.50 +- 0.06) µm/°C, when increasing the peak firing temperature within an industrially applicable range. In this way, the maximum spread limit of diffused silicon in aluminum is predictable and does not depend on the contact area size but on the firing temperature. Therefore, the geometry of the rear side pattern can influence not only series resistance losses within the solar cell but the process of contact formation itself. In addition, too fast cooling lead to Kirkendall void formations instead of an eutectic layer</dcterms:abstract> <dc:contributor>Schubert, Gunnar</dc:contributor> <dspace:isPartOfCollection rdf:resource=""/> <foaf:homepage rdf:resource="http://localhost:8080/jspui"/> <dc:language>eng</dc:language> </rdf:Description> </rdf:RDF>

This item appears in the following Collection(s)

Search KOPS


My Account