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Up to 20% efficient solar cells on monocrystalline silicon wafers by using a KOH - High Boiling Alcohol (HBA) texturing solution

Up to 20% efficient solar cells on monocrystalline silicon wafers by using a KOH - High Boiling Alcohol (HBA) texturing solution

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XIMELLO-QUIEBRAS, Jose Nestor, Johannes JUNGE, Sven SEREN, Giso HAHN, Ernst EPPLE, 2011. Up to 20% efficient solar cells on monocrystalline silicon wafers by using a KOH - High Boiling Alcohol (HBA) texturing solution. 26th European Photovoltaic Solar Energy Conference and Exhibition. CCH Congress Centre and International Fair, Hamburg, Germany, 5. Sep 2011 - 9. Sep 2011. In: OSSENBRINK, H., ed. and others. Proceedings / 26th European Photovoltaic Solar Energy Conference and Exhibition : the most inspiring platform for the global PV solar sector. 26th European Photovoltaic Solar Energy Conference and Exhibition. CCH Congress Centre and International Fair, Hamburg, Germany, 5. Sep 2011 - 9. Sep 2011. Munich, Germany:WIP-Renewable Energies, pp. 849-852. ISBN 3-936338-27-2

@inproceedings{Ximello-Quiebras2011effic-19208, title={Up to 20% efficient solar cells on monocrystalline silicon wafers by using a KOH - High Boiling Alcohol (HBA) texturing solution}, year={2011}, doi={10.4229/26thEUPVSEC2011-2AO.1.6}, isbn={3-936338-27-2}, address={Munich, Germany}, publisher={WIP-Renewable Energies}, booktitle={Proceedings / 26th European Photovoltaic Solar Energy Conference and Exhibition : the most inspiring platform for the global PV solar sector}, pages={849--852}, editor={Ossenbrink, H.}, author={Ximello-Quiebras, Jose Nestor and Junge, Johannes and Seren, Sven and Hahn, Giso and Epple, Ernst} }

<rdf:RDF xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcterms="http://purl.org/dc/terms/" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/rdf/resource/123456789/19208"> <dc:contributor>Junge, Johannes</dc:contributor> <dc:creator>Junge, Johannes</dc:creator> <dc:contributor>Ximello-Quiebras, Jose Nestor</dc:contributor> <dc:contributor>Seren, Sven</dc:contributor> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2012-05-07T07:38:13Z</dcterms:available> <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/19208"/> <dc:rights>deposit-license</dc:rights> <dc:creator>Seren, Sven</dc:creator> <dcterms:title>Up to 20% efficient solar cells on monocrystalline silicon wafers by using a KOH - High Boiling Alcohol (HBA) texturing solution</dcterms:title> <dc:contributor>Hahn, Giso</dc:contributor> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2012-05-07T07:38:13Z</dc:date> <dcterms:bibliographicCitation>Publ. in: Proceedings / 26th European Photovoltaic Solar Energy Conference and Exhibition : the most inspiring platform for the global PV solar sector ; CCH Congress Centre and International Fair, Hamburg, Germany, Conference 5 - 9 September 2011, exhibition 5 - 8 September 2011 / ed. by H. Ossenbrink ... . - München : WIP Renewable Energies, 2011. - S. 849-852. - ISBN 3-936338-27-2</dcterms:bibliographicCitation> <dc:creator>Epple, Ernst</dc:creator> <dc:language>eng</dc:language> <dc:creator>Hahn, Giso</dc:creator> <dcterms:abstract xml:lang="eng">We have textured (100) p-type Czochralski (Cz) monocrystalline Silicon (Si) wafers by using an aqueous solution of potassium hydroxide (KOH) and a High Boiling Alcohol (HBA). Cz-Si wafers textured with the KOH-HBA solution were processed into solar cells via the standard industrial screen printing method and an advanced industrial process (selective emitter process). Also, high quality float zone (FZ) Si material was textured and processed into solar cells by using a lab-type cell process. Industrially processed cells achieve efficiencies of 17.6% and 18.2%, respectively. Lab-type processed cells (2x2 cm2) achieve an efficiency of up to 20%. In addition, for the standard KOH-Isopropyl alcohol (IPA) etching solution a new etching bath setup has been developed. The new bath setup allows the recuperation of IPA during the texturisation process, as well as vacuum processing steps during the texturisation, which considerably reduces etching time.</dcterms:abstract> <dcterms:issued>2011</dcterms:issued> <dcterms:rights rdf:resource="http://nbn-resolving.org/urn:nbn:de:bsz:352-20140905103605204-4002607-1"/> <dc:creator>Ximello-Quiebras, Jose Nestor</dc:creator> <dc:contributor>Epple, Ernst</dc:contributor> </rdf:Description> </rdf:RDF>

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