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Patterning poly(3-Hexylthiophene) in the sub-50-nm region by nanoimprint lithography

Patterning poly(3-Hexylthiophene) in the sub-50-nm region by nanoimprint lithography

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SCARPA, Giuseppe, Alaa ABDELLAH, Armin EXNER, Stefan HARRER, Guillermo Penso BLANCO, Wolfgang WIEDEMANN, Lukas SCHMIDT-MENDE, Paolo LUGLI, 2011. Patterning poly(3-Hexylthiophene) in the sub-50-nm region by nanoimprint lithography. In: IEEE Transactions on Nanotechnology. 10(3), pp. 482-488. ISSN 1536-125X. Available under: doi: 10.1109/TNANO.2010.2048433

@article{Scarpa2011Patte-19192, title={Patterning poly(3-Hexylthiophene) in the sub-50-nm region by nanoimprint lithography}, year={2011}, doi={10.1109/TNANO.2010.2048433}, number={3}, volume={10}, issn={1536-125X}, journal={IEEE Transactions on Nanotechnology}, pages={482--488}, author={Scarpa, Giuseppe and Abdellah, Alaa and Exner, Armin and Harrer, Stefan and Blanco, Guillermo Penso and Wiedemann, Wolfgang and Schmidt-Mende, Lukas and Lugli, Paolo} }

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