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Annealing behavior of Al2O3 thin films grown on crystalline silicon by atomic layer deposition

Annealing behavior of Al2O3 thin films grown on crystalline silicon by atomic layer deposition

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LÜDER, Thomas, Bernd RAABE, Barbara TERHEIDEN, 2010. Annealing behavior of Al2O3 thin films grown on crystalline silicon by atomic layer deposition. 25th European Photovoltaic Solar Energy Conference and Exhibition. 5th World Conference on photovoltaic Energy Conversion. Valencia, Spain, 6. Sep 2010 - 10. Sep 2010. In: DE SANTI, G.F., ed., H. OSSENBRINK, ed., P. HELM, ed.. 25th European Photovoltaic Solar Energy Conference and Exhibition. 25th European Photovoltaic Solar Energy Conference and Exhibition. 5th World Conference on photovoltaic Energy Conversion. Valencia, Spain, 6. Sep 2010 - 10. Sep 2010. Munich, Germany:WIP-Renewable Energies, pp. 2138-2140. Available under: doi: 10.4229/25thEUPVSEC2010-2CV.3.20

@inproceedings{Luder2010Annea-16036, title={Annealing behavior of Al2O3 thin films grown on crystalline silicon by atomic layer deposition}, year={2010}, doi={10.4229/25thEUPVSEC2010-2CV.3.20}, address={Munich, Germany}, publisher={WIP-Renewable Energies}, booktitle={25th European Photovoltaic Solar Energy Conference and Exhibition}, pages={2138--2140}, editor={de Santi, G.F. and Ossenbrink, H. and Helm, P.}, author={Lüder, Thomas and Raabe, Bernd and Terheiden, Barbara} }

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