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Evaluating the efficiency limits of low cost mc Si materials using advanced solar cell processes

Evaluating the efficiency limits of low cost mc Si materials using advanced solar cell processes

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JUNGE, Johannes, Jan EBSER, Sabine GRAF, Barbara TERHEIDEN, Sven SEREN, Giso HAHN, Martin KAES, 2010. Evaluating the efficiency limits of low cost mc Si materials using advanced solar cell processes. 25th European Photovoltaic Solar Energy Conference and Exhibition. 5th World Conference on photovoltaic Energy Conversion. Valencia, Spain, 6. Sep 2010 - 10. Sep 2010. In: DE SANTI, G.F., ed., H. OSSENBRINK, ed., P. HELM, ed.. 25th European Photovoltaic Solar Energy Conference and Exhibition. 5th World Conference on photovoltaic Energy Conversion. 25th European Photovoltaic Solar Energy Conference and Exhibition. 5th World Conference on photovoltaic Energy Conversion. Valencia, Spain, 6. Sep 2010 - 10. Sep 2010. Munich, Germany:WIP-Renewable Energies, pp. 1722-1726

@inproceedings{Junge2010Evalu-16029, title={Evaluating the efficiency limits of low cost mc Si materials using advanced solar cell processes}, year={2010}, doi={10.4229/25thEUPVSEC2010-2CV.2.2}, address={Munich, Germany}, publisher={WIP-Renewable Energies}, booktitle={25th European Photovoltaic Solar Energy Conference and Exhibition. 5th World Conference on photovoltaic Energy Conversion}, pages={1722--1726}, editor={de Santi, G.F. and Ossenbrink, H. and Helm, P.}, author={Junge, Johannes and Ebser, Jan and Graf, Sabine and Terheiden, Barbara and Seren, Sven and Hahn, Giso and Kaes, Martin} }

<rdf:RDF xmlns:rdf="http://www.w3.org/1999/02/22-rdf-syntax-ns#" xmlns:bibo="http://purl.org/ontology/bibo/" xmlns:dc="http://purl.org/dc/elements/1.1/" xmlns:dcterms="http://purl.org/dc/terms/" xmlns:xsd="http://www.w3.org/2001/XMLSchema#" > <rdf:Description rdf:about="https://kops.uni-konstanz.de/rdf/resource/123456789/16029"> <dc:contributor>Kaes, Martin</dc:contributor> <dcterms:bibliographicCitation>Publ. in: 25th European Photovoltaic Solar Energy Conference and Exhibition. 5th World Conference on photovoltaic Energy Conversion : proceedings of the international conference held 6-10 September 2010, in Valencia, Spain / G.F. de Santi, H. Ossenbrink and P. Helm (eds.). Munich, Germany : WIP-Renewable Energies, 2010. pp. 1722-1726</dcterms:bibliographicCitation> <dc:contributor>Hahn, Giso</dc:contributor> <dc:date rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-10-05T09:36:50Z</dc:date> <bibo:uri rdf:resource="http://kops.uni-konstanz.de/handle/123456789/16029"/> <dc:creator>Terheiden, Barbara</dc:creator> <dc:contributor>Seren, Sven</dc:contributor> <dc:contributor>Junge, Johannes</dc:contributor> <dc:creator>Graf, Sabine</dc:creator> <dcterms:title>Evaluating the efficiency limits of low cost mc Si materials using advanced solar cell processes</dcterms:title> <dc:creator>Kaes, Martin</dc:creator> <dcterms:issued>2010</dcterms:issued> <dc:creator>Ebser, Jan</dc:creator> <dc:creator>Hahn, Giso</dc:creator> <dc:contributor>Graf, Sabine</dc:contributor> <dc:rights>deposit-license</dc:rights> <dc:contributor>Terheiden, Barbara</dc:contributor> <dcterms:available rdf:datatype="http://www.w3.org/2001/XMLSchema#dateTime">2011-10-05T09:36:50Z</dcterms:available> <dc:contributor>Ebser, Jan</dc:contributor> <dc:language>eng</dc:language> <dcterms:abstract xml:lang="eng">The evaluation of the efficiency potential of Si materials for solar cell production is one key aspect for strategic decisions in today’s photovoltaic business. In this work a flexible photolithography-based cell process is presented which is in particular well-suited for defect-rich multicrystalline Si material. One decisive feature is the low overall thermal budget of the process since it is based on only one longer high-temperature step (the P diffusion) and a short firing step to obtain a decent hydrogen passivation from a hydrogen-rich PECVD (Plasma-Enhanced Chemical Vapor Deposition) SiNx:H layer. A further MIRHP (Microwave Induced Remote Hydrogen Plasma) step at a temperature below 400°C completes the hydrogen passivation of bulk defects. The process is derived from the standard photolithography based process at the University of Konstanz (UKN) and can easily be adapted to all kinds of dielectric rear side passivation patterns like a-Si, SiO2, SiCx and Al2O3 or stack systems. The rear side contact in this approach is established by Laser Fired Contacts (LFCs). Results presented in this work originate from a process based on an Al2O3 rear side passivation which is deposited at less than 200°C and subsequently annealed at about 400°C. Efficiencies above 18% on EFG and Calisolar polysilicon material, above 14% on RGS and above 20% on FZ reference material are demonstrated on 2 x 2 cm2 solar cells. For all mc-Si materials these efficiencies are very close to the highest efficiencies ever obtained by applying other already established high efficiency processes.</dcterms:abstract> <dc:creator>Seren, Sven</dc:creator> <dc:creator>Junge, Johannes</dc:creator> <dcterms:rights rdf:resource="http://nbn-resolving.org/urn:nbn:de:bsz:352-20140905103605204-4002607-1"/> </rdf:Description> </rdf:RDF>

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